Mechanistic Study of Plasma Damage and CH4 Recovery of Low k Dielectric Surface

A mechanistic study was performed to investigate plasma damage and CFL, recovery of porous carbon-doped oxide (CDO) low k surfaces. First the nature of damage was examined for different plasma treatments in a standard RIE chamber then followed by a study using a downstream hybrid plasma source with...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Bao, J.J., Shi, H.L., Liu, J.J., Huang, H., Ho, P.S., Goodner, M.D., Moinpour, M., Kloster, G.M.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Dielectrics Optical films Plasma applications Plasma chemistry Plasma density Plasma materials processing Plasma measurements Plasma simulation Plasma sources Plasma x-ray sources
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!