Leakage Current Characteristic of Pre-Damaged Interlayer Dielectric During Voltage Ramp Method

Leakage Current Characteristic of Pre-Damaged Interlayer Dielectric During Voltage Ramp Method

In order to investigate the effects of Cu ions migration under BTS, VRDB tests were conducted on the pre-damaged samples. From the various VRDB tests on intrinsic and extrinsic system, migrated Cu ion from electrode plays a role of PF trap site. Since the migration of Cu ions is faster than the form...

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Bibliographische Detailangaben
Hauptverfasser: Sang-Soo Hwang, Sung-Yup Jung, Young-Chang Joo
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Breakdown voltage
Dielectric breakdown
Electric breakdown
Electrodes
Electrons
Leakage current
Materials science and technology
Performance evaluation
Stress
System testing
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Beschreibung
Zusammenfassung:In order to investigate the effects of Cu ions migration under BTS, VRDB tests were conducted on the pre-damaged samples. From the various VRDB tests on intrinsic and extrinsic system, migrated Cu ion from electrode plays a role of PF trap site. Since the migration of Cu ions is faster than the formation of intrinsic defects, TTF is set by the migration of Cu ions in extrinsic system.
ISSN:1541-7026
1938-1891
DOI:10.1109/RELPHY.2007.369984