Extreme Ultraviolet Radiation from Z-pinch Plasmas for Next Generation Lithography

Development of the high power EUV (extreme ultraviolet) source has been expected as a light source for the next generation lithography. There are two kinds of EUV sources: the discharge produced plasma (DPP) and the laser produced plasma (LPP). The DPP method is considered to be promising in easines...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Akiyama, H., Katsuki, S., Namihira, T., Sakugawa, T., Imamura, H.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Electron tubes Fault location Lithography Magnetic field measurement Plasma density Plasma sources Plasma temperature Plasma waves Ultraviolet sources Voltage
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