Variation
Variation afflicts the design, manufacture, and operation of integrated circuits. Statistical metrology seeks to characterize and model variations and their sources, particularly through new variation test circuits. Advanced process control attempts to reduce process variation through sensing and co...
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| creator | Boning, D. Balakrishnan, K. Cai, H. Drego, N. Farahanchi, A. Gettings, K. Lim, D. Somani, A. Taylor, H. Truque, D. Xiaolin Xie |
| description | Variation afflicts the design, manufacture, and operation of integrated circuits. Statistical metrology seeks to characterize and model variations and their sources, particularly through new variation test circuits. Advanced process control attempts to reduce process variation through sensing and control during fabrication. Design for manufacturability seeks methods to improve performance and yield given process and environmental variation, through robust design, increased regularity, and other approaches. Tools and techniques are needed in all of these areas; improvements in and increased linkage between statistical metrology and DFM will be particularly important and empowering |
| doi_str_mv | 10.1109/ISQED.2007.165 |
| format | Conference Proceeding |
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| fulltext | fulltext_linktorsrc |
| identifier | ISSN: 1948-3287 |
| ispartof | 8th International Symposium on Quality Electronic Design (ISQED'07), 2007, p.15-20 |
| issn | 1948-3287 1948-3295 |
| language | eng |
| recordid | cdi_ieee_primary_4149005 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Circuit testing Couplings Design for manufacture Fabrication Integrated circuit manufacture Integrated circuit yield Manufacturing processes Metrology Process control Robustness |
| title | Variation |
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