Development of Roll Metal Mold by Synchrotron Radiation
Embossing roll processing is one of various highly efficient processing methods for continuously printing a pattern designed on the surface of a roll onto sheets and plates. Efforts to apply the embossing roll processing method to the fabrication of micro components have drawn attention recently. Th...
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creator | Idei, K. Ishizawa, N. Noda, D. Hattori, T. |
description | Embossing roll processing is one of various highly efficient processing methods for continuously printing a pattern designed on the surface of a roll onto sheets and plates. Efforts to apply the embossing roll processing method to the fabrication of micro components have drawn attention recently. This paper details our study to produce a micro patterned embossing roll with a 3D X-ray lithography process. More specifically, the outer surface of a cylindrical steel roll (12 mm in diameter) was coated with photo resist, and 3D X-ray lithography with synchrotron radiation was employed to fabricate a hole-shaped pattern (approx. 10 mum in diameter) on the outer surface. The outer surface of the roll was then plated with copper to fabricate copper dots (each approx. 10 mum in diameter), which were used as etching masks to perform wet etching on the roll. Consequently, we were able to fabricate a structure whose outer surface is dotted with numerous microstructures. However, edge of the pattern part that was masked by copper was underetched, and the expected shape was not able to obtain. Then, we examined the possibility of the processing by the verification of the problem of a wet etching, and the dry etching |
doi_str_mv | 10.1109/MHS.2006.320295 |
format | Conference Proceeding |
fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_4110398</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>4110398</ieee_id><sourcerecordid>4110398</sourcerecordid><originalsourceid>FETCH-LOGICAL-i90t-8938e4129da1232861144a598c6ffc805323c0276731b0a672fc6c1397fc67e93</originalsourceid><addsrcrecordid>eNotj0tLAzEURgMiqLVrF27yB2a8NzfPpdRHhRah7b6kmQyOpJMyE4T59w7oWXxn98Fh7AGhRgT3tF3vawGgaxIgnLpidyiFlGDQ6Bu2HMdvmCGnFMhbZl7iT0z5co594bnlu5wS38bi582p4aeJ76c-fA25DLnnO990vnS5v2fXrU9jXP57wQ5vr4fVutp8vn-snjdV56BU1pGNEoVrPAoSViNK6ZWzQbdtsKBIUABhtCE8gddGtEEHJGdmm-howR7_brsY4_EydGc_TEc5h5Kz9AujqEH1</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Development of Roll Metal Mold by Synchrotron Radiation</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Idei, K. ; Ishizawa, N. ; Noda, D. ; Hattori, T.</creator><creatorcontrib>Idei, K. ; Ishizawa, N. ; Noda, D. ; Hattori, T.</creatorcontrib><description>Embossing roll processing is one of various highly efficient processing methods for continuously printing a pattern designed on the surface of a roll onto sheets and plates. Efforts to apply the embossing roll processing method to the fabrication of micro components have drawn attention recently. This paper details our study to produce a micro patterned embossing roll with a 3D X-ray lithography process. More specifically, the outer surface of a cylindrical steel roll (12 mm in diameter) was coated with photo resist, and 3D X-ray lithography with synchrotron radiation was employed to fabricate a hole-shaped pattern (approx. 10 mum in diameter) on the outer surface. The outer surface of the roll was then plated with copper to fabricate copper dots (each approx. 10 mum in diameter), which were used as etching masks to perform wet etching on the roll. Consequently, we were able to fabricate a structure whose outer surface is dotted with numerous microstructures. However, edge of the pattern part that was masked by copper was underetched, and the expected shape was not able to obtain. Then, we examined the possibility of the processing by the verification of the problem of a wet etching, and the dry etching</description><identifier>ISBN: 1424407176</identifier><identifier>ISBN: 9781424407170</identifier><identifier>DOI: 10.1109/MHS.2006.320295</identifier><language>eng</language><publisher>IEEE</publisher><subject>Copper ; Embossing ; Fabrication ; Microstructure ; Printing ; Resists ; Steel ; Synchrotron radiation ; Wet etching ; X-ray lithography</subject><ispartof>2006 IEEE International Symposium on MicroNanoMechanical and Human Science, 2006, p.1-6</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4110398$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2052,27902,54895</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4110398$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Idei, K.</creatorcontrib><creatorcontrib>Ishizawa, N.</creatorcontrib><creatorcontrib>Noda, D.</creatorcontrib><creatorcontrib>Hattori, T.</creatorcontrib><title>Development of Roll Metal Mold by Synchrotron Radiation</title><title>2006 IEEE International Symposium on MicroNanoMechanical and Human Science</title><addtitle>MHS</addtitle><description>Embossing roll processing is one of various highly efficient processing methods for continuously printing a pattern designed on the surface of a roll onto sheets and plates. Efforts to apply the embossing roll processing method to the fabrication of micro components have drawn attention recently. This paper details our study to produce a micro patterned embossing roll with a 3D X-ray lithography process. More specifically, the outer surface of a cylindrical steel roll (12 mm in diameter) was coated with photo resist, and 3D X-ray lithography with synchrotron radiation was employed to fabricate a hole-shaped pattern (approx. 10 mum in diameter) on the outer surface. The outer surface of the roll was then plated with copper to fabricate copper dots (each approx. 10 mum in diameter), which were used as etching masks to perform wet etching on the roll. Consequently, we were able to fabricate a structure whose outer surface is dotted with numerous microstructures. However, edge of the pattern part that was masked by copper was underetched, and the expected shape was not able to obtain. Then, we examined the possibility of the processing by the verification of the problem of a wet etching, and the dry etching</description><subject>Copper</subject><subject>Embossing</subject><subject>Fabrication</subject><subject>Microstructure</subject><subject>Printing</subject><subject>Resists</subject><subject>Steel</subject><subject>Synchrotron radiation</subject><subject>Wet etching</subject><subject>X-ray lithography</subject><isbn>1424407176</isbn><isbn>9781424407170</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2006</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotj0tLAzEURgMiqLVrF27yB2a8NzfPpdRHhRah7b6kmQyOpJMyE4T59w7oWXxn98Fh7AGhRgT3tF3vawGgaxIgnLpidyiFlGDQ6Bu2HMdvmCGnFMhbZl7iT0z5co594bnlu5wS38bi582p4aeJ76c-fA25DLnnO990vnS5v2fXrU9jXP57wQ5vr4fVutp8vn-snjdV56BU1pGNEoVrPAoSViNK6ZWzQbdtsKBIUABhtCE8gddGtEEHJGdmm-howR7_brsY4_EydGc_TEc5h5Kz9AujqEH1</recordid><startdate>200611</startdate><enddate>200611</enddate><creator>Idei, K.</creator><creator>Ishizawa, N.</creator><creator>Noda, D.</creator><creator>Hattori, T.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>200611</creationdate><title>Development of Roll Metal Mold by Synchrotron Radiation</title><author>Idei, K. ; Ishizawa, N. ; Noda, D. ; Hattori, T.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-8938e4129da1232861144a598c6ffc805323c0276731b0a672fc6c1397fc67e93</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Copper</topic><topic>Embossing</topic><topic>Fabrication</topic><topic>Microstructure</topic><topic>Printing</topic><topic>Resists</topic><topic>Steel</topic><topic>Synchrotron radiation</topic><topic>Wet etching</topic><topic>X-ray lithography</topic><toplevel>online_resources</toplevel><creatorcontrib>Idei, K.</creatorcontrib><creatorcontrib>Ishizawa, N.</creatorcontrib><creatorcontrib>Noda, D.</creatorcontrib><creatorcontrib>Hattori, T.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Idei, K.</au><au>Ishizawa, N.</au><au>Noda, D.</au><au>Hattori, T.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Development of Roll Metal Mold by Synchrotron Radiation</atitle><btitle>2006 IEEE International Symposium on MicroNanoMechanical and Human Science</btitle><stitle>MHS</stitle><date>2006-11</date><risdate>2006</risdate><spage>1</spage><epage>6</epage><pages>1-6</pages><isbn>1424407176</isbn><isbn>9781424407170</isbn><abstract>Embossing roll processing is one of various highly efficient processing methods for continuously printing a pattern designed on the surface of a roll onto sheets and plates. Efforts to apply the embossing roll processing method to the fabrication of micro components have drawn attention recently. This paper details our study to produce a micro patterned embossing roll with a 3D X-ray lithography process. More specifically, the outer surface of a cylindrical steel roll (12 mm in diameter) was coated with photo resist, and 3D X-ray lithography with synchrotron radiation was employed to fabricate a hole-shaped pattern (approx. 10 mum in diameter) on the outer surface. The outer surface of the roll was then plated with copper to fabricate copper dots (each approx. 10 mum in diameter), which were used as etching masks to perform wet etching on the roll. Consequently, we were able to fabricate a structure whose outer surface is dotted with numerous microstructures. However, edge of the pattern part that was masked by copper was underetched, and the expected shape was not able to obtain. Then, we examined the possibility of the processing by the verification of the problem of a wet etching, and the dry etching</abstract><pub>IEEE</pub><doi>10.1109/MHS.2006.320295</doi><tpages>6</tpages></addata></record> |
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ispartof | 2006 IEEE International Symposium on MicroNanoMechanical and Human Science, 2006, p.1-6 |
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language | eng |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Copper Embossing Fabrication Microstructure Printing Resists Steel Synchrotron radiation Wet etching X-ray lithography |
title | Development of Roll Metal Mold by Synchrotron Radiation |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-14T13%3A49%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Development%20of%20Roll%20Metal%20Mold%20by%20Synchrotron%20Radiation&rft.btitle=2006%20IEEE%20International%20Symposium%20on%20MicroNanoMechanical%20and%20Human%20Science&rft.au=Idei,%20K.&rft.date=2006-11&rft.spage=1&rft.epage=6&rft.pages=1-6&rft.isbn=1424407176&rft.isbn_list=9781424407170&rft_id=info:doi/10.1109/MHS.2006.320295&rft_dat=%3Cieee_6IE%3E4110398%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=4110398&rfr_iscdi=true |