Micro-Crystalline Silicon Thin Films Deposited by the Reactive RF Magnetron Sputtering System

Hydrogenated micro-crystalline silicon (muc-Si:H) thin films were deposited by the RF magnetron sputtering system with argon and hydrogen mixture gases. The high-quality muc-Si:H films were successfully produced at 200degC. The dark conductivity of 5.5times10 -9 S/cm and two order of magnitude of ph...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Oyama, A., Nakamura, I., Isomura, M.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Argon Conductivity Crystallization Gases Hydrogen Plasma temperature Radio frequency Semiconductor thin films Silicon Sputtering
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!