The effects of process variations on the performance of MCM-D interconnects

The performance of thin film interconnects is dependent upon successful interaction between design and the fabrication process. The functional verification of process tolerances to achieve the originally simulated design requirements is addressed. Variational analysis results about the nominal desig...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Solomon, D., Adams, R., Lanka, M., Berry, K., El-Kilani, S.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Chemical technology Conductors Dielectric substrates Dielectric thin films Fabrication Impedance Nonhomogeneous media Stripline Testing Vehicles
Online-Zugang:	Volltext bestellen
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