Experimental Evaluation of Second Harmonic Generation for Non-Invasive Contamination Detection in SOI Wafers

Experimental Evaluation of Second Harmonic Generation for Non-Invasive Contamination Detection in SOI Wafers

We report experimental results from non-invasive second harmonic generation (SHG) measurements applied to detect the presence of contamination at the silicon/buried oxide (BOX) and BOX/substrate interfaces in silicon-on-insulator (SOI) wafers. The potential application of SHG as a metrology tool for...

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Hauptverfasser: Alles, M.L., Pasternak, R., Tolk, N.H., Schrimpf, R.D., Fleetwood, D.M., Standley, R.W.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Contamination
Frequency conversion
Metrology
Optical harmonic generation
Plasma measurements
Pollution measurement
Pulse measurements
Semiconductor materials
Silicon on insulator technology
Ultrafast optics
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Zusammenfassung:We report experimental results from non-invasive second harmonic generation (SHG) measurements applied to detect the presence of contamination at the silicon/buried oxide (BOX) and BOX/substrate interfaces in silicon-on-insulator (SOI) wafers. The potential application of SHG as a metrology tool for process control is demonstrated
ISSN:1078-8743
2376-6697
DOI:10.1109/ASMC.2006.1638714