Ultra shallow junctions formed by sub-melt laser annealing

Since the requirements for the S/D extensions for future devices become more and more severe with respect to activation and vertical abruptness, a huge effort has been done to develop ultra-fast annealing techniques such as laser annealing. Due to the fact that only the surface layers are heated, th...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Falepin, A., Janssens, T., Severi, S., Vandervorst, W., Felch, S.B., Parihar, V., Mayur, A.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Annealing Cooling Electrical resistance measurement Heat sinks Implants Lattices Optical materials Probes Silicon Temperature
Online-Zugang:	Volltext bestellen
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