Stimulation of a microwave plasmachemical photoresist removal process by a self-sustained low-frequency discharge

The results of studying the effect of the external energy influence of a low-frequency field (f=10 KHz) on the degree of the chemical activity of the microwave discharge plasma (f=2.45 GHz) excited in a volumetric type plasmatrone reactor with an applicator on the basis of a rectangular resonator ar...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Bordusov, S.V., Shynkevich, Y.S., Emelianov, A.V.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Applicators Chemical reactors Coatings Frequency synchronization Inductors Microwave frequencies Plasma chemistry Protection Resists Surface discharges
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