Dual Damascene: a ULSI wiring technology

Escalating density, performance, and (perhaps most importantly) manufacturing requirements associated with ULSI semiconducting wiring, necessitate a metamorphosis in interconnection technology. To meet these needs, an inlaid fully integrated wiring technology called Dual Damascene has been designed...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kaanta, C.W., Bombardier, S.G., Cote, W.J., Hill, W.R., Kerszykowski, G., Landis, H.S., Poindexter, D.J., Pollard, C.W., Ross, G.H., Ryan, J.G., Wolff, S., Cronin, J.E.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Chemical processes Chemical technology Etching Insulation Metal-insulator structures Planarization Semiconductivity Semiconductor device manufacture Ultra large scale integration Wiring
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