Hot-wire chemical vapor deposition of silicon nitride for multicrystalline silicon solar cells

A new regime of high rate deposition of silicon nitride by hot wire chemical vapor deposition was investigated. The present design of the filament arrangement and the showerhead gas supply system allows for virtually unlimited scale-up. The deposition rates obtained were in excess of 5 nm/s. The ref...

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Bibliographische Detailangaben

Hauptverfasser:	Goldbach, H.D., van der Werf, C.H.M., Loffler, J., Scarfo, A., Kylner, A.M.C., Stannowski, B., ArnoldBik, W.M., Weeber, A., Rieffe, H., Soppe, W.J., Rath, J.K., Schropp, R.E.I.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Chemical vapor deposition Extinction coefficients Optical films Passivation Photovoltaic cells Photovoltaic systems Refractive index Silicon Testing Wire
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