Electron irradiation effects in MOS systems
Flat-band shift measurements were made on p-type MOS devices irradiated with electrons at various gate-bias voltages. A structured reproducible curve of flat-band shift versus gate bias was obtained which could not be readily accounted for with existing models. Experimental data were taken over a wi...
Gespeichert in:
Veröffentlicht in: | IEEE (Inst. Electr. Electron. Eng.) Trans. Electron Devices., v. ED- 21, no. 12, pp. 768-777 v. ED- 21, no. 12, pp. 768-777, 1974-12, Vol.21 (12), p.768-777 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!