Wavelength-selective components in SOI photonic wires fabricated with deep UV lithography

We demonstrate both ring resonator drop filters and arrayed waveguide gratings in silicon-on-insulator photonic wires. The structures are fabricated in a CMOS line using deep UV lithography and dry etching processes. Waveguide losses are as low as 2.4 dB/cm for a 500 nm wide photonic wire, with exce...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Dumon, P., Bogaerts, W., Van Thourhout, D., Taillaert, D., Wiaux, V., Beckx, S., Wouters, J., Baets, R.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Arrayed waveguide gratings CMOS process Dry etching Fiber gratings Lithography Optical losses Optical ring resonators Resonator filters Silicon on insulator technology Wires
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!