A new approach to RF thin film microinductors

A new approach to RF thin film inductors has been investigated. A toroid inductor design was realized in thin film technology. An operating frequency in the range from 100MHz to 3 GHz was targeted. Softmagnetic FeCoBSi was used as cure material. The magnetic film were sputter deposited in a multilay...

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Hauptverfasser: Froramberger, M., Tewes, M., McCord, J., Hartung, W., Loschand, R., Quandt, E.
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creator Froramberger, M.
Tewes, M.
McCord, J.
Hartung, W.
Loschand, R.
Quandt, E.
description A new approach to RF thin film inductors has been investigated. A toroid inductor design was realized in thin film technology. An operating frequency in the range from 100MHz to 3 GHz was targeted. Softmagnetic FeCoBSi was used as cure material. The magnetic film were sputter deposited in a multilayer way to realize a crossed magnetic anisotropy in the core. High frequency measurements illustrate the advantages of the unique magnetic geometry. The influence and benefits of such a magnetic core on microinductors will he discused in detail. The results show, that such crossed anisotropy microinductors are very promising alternative to common planar spiral inductors in the RF range.
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Inductors
Magnetic anisotropy
Magnetic cores
Magnetic flux
Magnetic materials
Perpendicular magnetic anisotropy
Q factor
Radio frequency
Toroidal magnetic fields
Transistors
title A new approach to RF thin film microinductors
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