Improved magnetron injection guns for high power RF applications

Summary form only given. Irrespective of the type RF device, the starting point for RF power production is generation of a high quality electron beam. The quality of the electron beam is determined by the optical design of the gun and the quality of the cathode. Unfortunately, RF engineers have insu...

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Hauptverfasser: Ives, L., Miram, G., Read, M., Mizuhara, M., Wilcox, R., Robinson, T., Borchard, P., Falce, L., Gunther, K.
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container_start_page 234
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creator Ives, L.
Miram, G.
Read, M.
Mizuhara, M.
Wilcox, R.
Robinson, T.
Borchard, P.
Falce, L.
Gunther, K.
description Summary form only given. Irrespective of the type RF device, the starting point for RF power production is generation of a high quality electron beam. The quality of the electron beam is determined by the optical design of the gun and the quality of the cathode. Unfortunately, RF engineers have insufficient control of cathode quality. A vacuum test facility has been constructed for measuring work function variations over the surface of magnetron injection guns. The electron gun from a CPI 140 GHz gyrotron is to be analyzed in the test chamber to locate regions of reduced emission. Nondestructive and, if necessary, destructive analysis is to be used to determine the cause of the reduced emission. Once causes are determined, modifications to materials, processes, techniques, or procedures are to be explored, in association with cathode manufacturers, to eliminate the causes of work function variation.
doi_str_mv 10.1109/IVELEC.2004.1316288
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fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_1316288</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1316288</ieee_id><sourcerecordid>1316288</sourcerecordid><originalsourceid>FETCH-LOGICAL-i88t-863ffcaaacec55a5ad18fb779cede9d727be238579e1631ca973dec95e29efeb3</originalsourceid><addsrcrecordid>eNotj9tKxDAYhAMiKGufYG_yAq05NE1yp5SuLhQEWbxd_qZ_ulm2B9Kq-PZW3GFgvothYAjZcpZxzuzj_qOqqzITjOUZl7wQxtyQxGrDVksjCm7vSDLPZ7YqVzkX_J487fspjl_Y0h66AZc4DjQMZ3RLWKn7HGbqx0hPoTvRafzGSN93FKbpEhz8VeYHcuvhMmNyzQ057KpD-ZrWby_78rlOgzFLagrpvQMAh04pUNBy4xutrcMWbauFblBIo7RFXkjuwGrZorMKhUWPjdyQ7f9sQMTjFEMP8ed4vSl_AW5PSnM</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Improved magnetron injection guns for high power RF applications</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Ives, L. ; Miram, G. ; Read, M. ; Mizuhara, M. ; Wilcox, R. ; Robinson, T. ; Borchard, P. ; Falce, L. ; Gunther, K.</creator><creatorcontrib>Ives, L. ; Miram, G. ; Read, M. ; Mizuhara, M. ; Wilcox, R. ; Robinson, T. ; Borchard, P. ; Falce, L. ; Gunther, K.</creatorcontrib><description>Summary form only given. Irrespective of the type RF device, the starting point for RF power production is generation of a high quality electron beam. The quality of the electron beam is determined by the optical design of the gun and the quality of the cathode. Unfortunately, RF engineers have insufficient control of cathode quality. A vacuum test facility has been constructed for measuring work function variations over the surface of magnetron injection guns. The electron gun from a CPI 140 GHz gyrotron is to be analyzed in the test chamber to locate regions of reduced emission. Nondestructive and, if necessary, destructive analysis is to be used to determine the cause of the reduced emission. Once causes are determined, modifications to materials, processes, techniques, or procedures are to be explored, in association with cathode manufacturers, to eliminate the causes of work function variation.</description><identifier>ISBN: 9780780382619</identifier><identifier>ISBN: 0780382617</identifier><identifier>DOI: 10.1109/IVELEC.2004.1316288</identifier><language>eng</language><publisher>IEEE</publisher><subject>Cathodes ; Electron beams ; Guns ; Magnetic analysis ; Optical design ; Power engineering and energy ; Power generation ; Production ; Radio frequency ; Test facilities</subject><ispartof>Fifth IEEE International Vacuum Electronics Conference (IEEE Cat. No.04EX786), 2004, p.234-235</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1316288$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,777,781,786,787,2052,4036,4037,27906,54901</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1316288$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Ives, L.</creatorcontrib><creatorcontrib>Miram, G.</creatorcontrib><creatorcontrib>Read, M.</creatorcontrib><creatorcontrib>Mizuhara, M.</creatorcontrib><creatorcontrib>Wilcox, R.</creatorcontrib><creatorcontrib>Robinson, T.</creatorcontrib><creatorcontrib>Borchard, P.</creatorcontrib><creatorcontrib>Falce, L.</creatorcontrib><creatorcontrib>Gunther, K.</creatorcontrib><title>Improved magnetron injection guns for high power RF applications</title><title>Fifth IEEE International Vacuum Electronics Conference (IEEE Cat. No.04EX786)</title><addtitle>IVELEC</addtitle><description>Summary form only given. Irrespective of the type RF device, the starting point for RF power production is generation of a high quality electron beam. The quality of the electron beam is determined by the optical design of the gun and the quality of the cathode. Unfortunately, RF engineers have insufficient control of cathode quality. A vacuum test facility has been constructed for measuring work function variations over the surface of magnetron injection guns. The electron gun from a CPI 140 GHz gyrotron is to be analyzed in the test chamber to locate regions of reduced emission. Nondestructive and, if necessary, destructive analysis is to be used to determine the cause of the reduced emission. Once causes are determined, modifications to materials, processes, techniques, or procedures are to be explored, in association with cathode manufacturers, to eliminate the causes of work function variation.</description><subject>Cathodes</subject><subject>Electron beams</subject><subject>Guns</subject><subject>Magnetic analysis</subject><subject>Optical design</subject><subject>Power engineering and energy</subject><subject>Power generation</subject><subject>Production</subject><subject>Radio frequency</subject><subject>Test facilities</subject><isbn>9780780382619</isbn><isbn>0780382617</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2004</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotj9tKxDAYhAMiKGufYG_yAq05NE1yp5SuLhQEWbxd_qZ_ulm2B9Kq-PZW3GFgvothYAjZcpZxzuzj_qOqqzITjOUZl7wQxtyQxGrDVksjCm7vSDLPZ7YqVzkX_J487fspjl_Y0h66AZc4DjQMZ3RLWKn7HGbqx0hPoTvRafzGSN93FKbpEhz8VeYHcuvhMmNyzQ057KpD-ZrWby_78rlOgzFLagrpvQMAh04pUNBy4xutrcMWbauFblBIo7RFXkjuwGrZorMKhUWPjdyQ7f9sQMTjFEMP8ed4vSl_AW5PSnM</recordid><startdate>2004</startdate><enddate>2004</enddate><creator>Ives, L.</creator><creator>Miram, G.</creator><creator>Read, M.</creator><creator>Mizuhara, M.</creator><creator>Wilcox, R.</creator><creator>Robinson, T.</creator><creator>Borchard, P.</creator><creator>Falce, L.</creator><creator>Gunther, K.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>2004</creationdate><title>Improved magnetron injection guns for high power RF applications</title><author>Ives, L. ; Miram, G. ; Read, M. ; Mizuhara, M. ; Wilcox, R. ; Robinson, T. ; Borchard, P. ; Falce, L. ; Gunther, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i88t-863ffcaaacec55a5ad18fb779cede9d727be238579e1631ca973dec95e29efeb3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2004</creationdate><topic>Cathodes</topic><topic>Electron beams</topic><topic>Guns</topic><topic>Magnetic analysis</topic><topic>Optical design</topic><topic>Power engineering and energy</topic><topic>Power generation</topic><topic>Production</topic><topic>Radio frequency</topic><topic>Test facilities</topic><toplevel>online_resources</toplevel><creatorcontrib>Ives, L.</creatorcontrib><creatorcontrib>Miram, G.</creatorcontrib><creatorcontrib>Read, M.</creatorcontrib><creatorcontrib>Mizuhara, M.</creatorcontrib><creatorcontrib>Wilcox, R.</creatorcontrib><creatorcontrib>Robinson, T.</creatorcontrib><creatorcontrib>Borchard, P.</creatorcontrib><creatorcontrib>Falce, L.</creatorcontrib><creatorcontrib>Gunther, K.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ives, L.</au><au>Miram, G.</au><au>Read, M.</au><au>Mizuhara, M.</au><au>Wilcox, R.</au><au>Robinson, T.</au><au>Borchard, P.</au><au>Falce, L.</au><au>Gunther, K.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Improved magnetron injection guns for high power RF applications</atitle><btitle>Fifth IEEE International Vacuum Electronics Conference (IEEE Cat. No.04EX786)</btitle><stitle>IVELEC</stitle><date>2004</date><risdate>2004</risdate><spage>234</spage><epage>235</epage><pages>234-235</pages><isbn>9780780382619</isbn><isbn>0780382617</isbn><abstract>Summary form only given. Irrespective of the type RF device, the starting point for RF power production is generation of a high quality electron beam. The quality of the electron beam is determined by the optical design of the gun and the quality of the cathode. Unfortunately, RF engineers have insufficient control of cathode quality. A vacuum test facility has been constructed for measuring work function variations over the surface of magnetron injection guns. The electron gun from a CPI 140 GHz gyrotron is to be analyzed in the test chamber to locate regions of reduced emission. Nondestructive and, if necessary, destructive analysis is to be used to determine the cause of the reduced emission. Once causes are determined, modifications to materials, processes, techniques, or procedures are to be explored, in association with cathode manufacturers, to eliminate the causes of work function variation.</abstract><pub>IEEE</pub><doi>10.1109/IVELEC.2004.1316288</doi><tpages>2</tpages></addata></record>
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subjects Cathodes
Electron beams
Guns
Magnetic analysis
Optical design
Power engineering and energy
Power generation
Production
Radio frequency
Test facilities
title Improved magnetron injection guns for high power RF applications
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T00%3A42%3A53IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Improved%20magnetron%20injection%20guns%20for%20high%20power%20RF%20applications&rft.btitle=Fifth%20IEEE%20International%20Vacuum%20Electronics%20Conference%20(IEEE%20Cat.%20No.04EX786)&rft.au=Ives,%20L.&rft.date=2004&rft.spage=234&rft.epage=235&rft.pages=234-235&rft.isbn=9780780382619&rft.isbn_list=0780382617&rft_id=info:doi/10.1109/IVELEC.2004.1316288&rft_dat=%3Cieee_6IE%3E1316288%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1316288&rfr_iscdi=true