Lithographic approach to pattern multiple nanoparticle thin films prepared by Layer-by-Layer self-assembly for microsystems

We report a lithographic approach to pattern multiple types of Layer-by-Layer self-assembled nanoparticle thin films. 150 nm and 64 nm polystyrene particles are separated in desired patterns with a feature size 5 to 20 microns. The process is quite simple, consisting of only two consecutive lift-off...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Tianhong Cui, Lvov, Y., Feng Hua, Jingshi Shi
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Adhesives Biomedical optical imaging Lithography Nanoparticles Optical device fabrication Optical films Optical sensors Self-assembly Silicon compounds Transistors
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