RIE-texturing of industrial multicrystalline silicon solar cells

We developed a maskless plasma texturing technique for multicrystalline Si (mc-Si) cells using reactive ion etching (RIE) that results in higher cell performance than that of standard untextured cells. Elimination of plasma damage has been achieved while keeping front reflectance to low levels. Inte...

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Bibliographische Detailangaben
Hauptverfasser:	Ruby, D.S., Zaidi, S.H., Narayanan, S., Bathey, B., Yamanaka, S., Balanga, R.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Applied sciences Costs Energy Etching Exact sciences and technology Laboratories Natural energy Photovoltaic cells Photovoltaic conversion Plasma applications Plasma chemistry Plasma waves Reflectivity Silicon Solar cells. Photoelectrochemical cells Solar energy Surface texture
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