Electrostatic Design of a Tunable Tetrode Electron Gun for Electron Beam Additive Manufacturing Device

The electron gun, as a critical device for emitting high-speed electrons, determines the electron beam current and quality in electron beam additive manufacturing (EBAM). In this article, a tetrode electron gun with a control electrode is designed to improve the quality and controllability of the el...

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Veröffentlicht in:IEEE transactions on plasma science 2024-07, Vol.52 (7), p.2760-2765
Hauptverfasser: Zhang, Zhenyi, Zhou, Zijian, Sheng, Keyan, Li, Haozhe, Xiong, Mianzhi, Xing, Jiangrui, Lin, Chunjiang, Huang, Jiang
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container_end_page 2765
container_issue 7
container_start_page 2760
container_title IEEE transactions on plasma science
container_volume 52
creator Zhang, Zhenyi
Zhou, Zijian
Sheng, Keyan
Li, Haozhe
Xiong, Mianzhi
Xing, Jiangrui
Lin, Chunjiang
Huang, Jiang
description The electron gun, as a critical device for emitting high-speed electrons, determines the electron beam current and quality in electron beam additive manufacturing (EBAM). In this article, a tetrode electron gun with a control electrode is designed to improve the quality and controllability of the electron beam. The control electrode, optimized by parametric simulation, provides secondary confinement of the electron beam. This confinement aims to reduce the beam spot size and emittance while decoupling spot size from the current. Specifically, the maximum attainable current reaches 200 mA, while the beam waist radius contracts to a mere 1.09 mm. The normalized emittance, a crucial parameter, measures at 1.536\times 10^{-{7}}~\text {m}\cdot \text {rad} . Furthermore, stability analysis of the electron gun explores the influence of electrode potential on its performance. By co-regulating the bias voltage and the control voltage, the electron beam current can smoothly rise to 200 mA while maintaining the beam spot radius of 2 mm. This article indicates the tetrode electron gun's potential for precise control, thereby improving the quality and precision of high melting point alloy additive manufacturing processes.
doi_str_mv 10.1109/TPS.2024.3449088
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fullrecord <record><control><sourceid>crossref_RIE</sourceid><recordid>TN_cdi_ieee_primary_10680254</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>10680254</ieee_id><sourcerecordid>10_1109_TPS_2024_3449088</sourcerecordid><originalsourceid>FETCH-LOGICAL-c147t-a4c166fcd59fc20595cdb5d1f7e9057aea4e4c65785ac237e7d6cec2c25f578f3</originalsourceid><addsrcrecordid>eNpNkEtLA0EQhAdRMEbvHjzMH9jY89rZOcYYoxBRcD0vk56eMJJsZB8B_70bEtBTQ3VVQX2M3QqYCAHuvnz_mEiQeqK0dlAUZ2wknHKZU9acsxGAU5kqhLpkV237BSC0ATlicb4h7Jpd2_kuIX-kNq1rvovc87Kv_WpDvKThH4ifnDVf9DWPu-ZPeCC_5dMQUpf2xF993UePXd-kej007hPSNbuIftPSzemO2efTvJw9Z8u3xctsusxQaNtlXqPI84jBuIgSjDMYViaIaMmBsZ68Jo25sYXxKJUlG3IklChNHMSoxgyOvThMahuK1XeTtr75qQRUB07VwKk6cKpOnIbI3TGSiOifPS9AGq1-AZmUZeE</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Electrostatic Design of a Tunable Tetrode Electron Gun for Electron Beam Additive Manufacturing Device</title><source>IEEE Electronic Library (IEL)</source><creator>Zhang, Zhenyi ; Zhou, Zijian ; Sheng, Keyan ; Li, Haozhe ; Xiong, Mianzhi ; Xing, Jiangrui ; Lin, Chunjiang ; Huang, Jiang</creator><creatorcontrib>Zhang, Zhenyi ; Zhou, Zijian ; Sheng, Keyan ; Li, Haozhe ; Xiong, Mianzhi ; Xing, Jiangrui ; Lin, Chunjiang ; Huang, Jiang</creatorcontrib><description>The electron gun, as a critical device for emitting high-speed electrons, determines the electron beam current and quality in electron beam additive manufacturing (EBAM). In this article, a tetrode electron gun with a control electrode is designed to improve the quality and controllability of the electron beam. The control electrode, optimized by parametric simulation, provides secondary confinement of the electron beam. This confinement aims to reduce the beam spot size and emittance while decoupling spot size from the current. Specifically, the maximum attainable current reaches 200 mA, while the beam waist radius contracts to a mere 1.09 mm. The normalized emittance, a crucial parameter, measures at &lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;1.536\times 10^{-{7}}~\text {m}\cdot \text {rad} &lt;/tex-math&gt;&lt;/inline-formula&gt;. Furthermore, stability analysis of the electron gun explores the influence of electrode potential on its performance. By co-regulating the bias voltage and the control voltage, the electron beam current can smoothly rise to 200 mA while maintaining the beam spot radius of 2 mm. This article indicates the tetrode electron gun's potential for precise control, thereby improving the quality and precision of high melting point alloy additive manufacturing processes.</description><identifier>ISSN: 0093-3813</identifier><identifier>EISSN: 1939-9375</identifier><identifier>DOI: 10.1109/TPS.2024.3449088</identifier><identifier>CODEN: ITPSBD</identifier><language>eng</language><publisher>IEEE</publisher><subject>Anodes ; Control electrode ; electric field ; Electric fields ; Electric potential ; electron beam additive manufacturing (EBAM) ; Electron beams ; electron gun ; Electron guns ; Electrons ; Focusing</subject><ispartof>IEEE transactions on plasma science, 2024-07, Vol.52 (7), p.2760-2765</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c147t-a4c166fcd59fc20595cdb5d1f7e9057aea4e4c65785ac237e7d6cec2c25f578f3</cites><orcidid>0009-0001-5933-9071 ; 0000-0001-9379-496X ; 0000-0001-7401-7612 ; 0000-0001-8959-325X ; 0000-0003-2764-7106</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/10680254$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/10680254$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Zhang, Zhenyi</creatorcontrib><creatorcontrib>Zhou, Zijian</creatorcontrib><creatorcontrib>Sheng, Keyan</creatorcontrib><creatorcontrib>Li, Haozhe</creatorcontrib><creatorcontrib>Xiong, Mianzhi</creatorcontrib><creatorcontrib>Xing, Jiangrui</creatorcontrib><creatorcontrib>Lin, Chunjiang</creatorcontrib><creatorcontrib>Huang, Jiang</creatorcontrib><title>Electrostatic Design of a Tunable Tetrode Electron Gun for Electron Beam Additive Manufacturing Device</title><title>IEEE transactions on plasma science</title><addtitle>TPS</addtitle><description>The electron gun, as a critical device for emitting high-speed electrons, determines the electron beam current and quality in electron beam additive manufacturing (EBAM). In this article, a tetrode electron gun with a control electrode is designed to improve the quality and controllability of the electron beam. The control electrode, optimized by parametric simulation, provides secondary confinement of the electron beam. This confinement aims to reduce the beam spot size and emittance while decoupling spot size from the current. Specifically, the maximum attainable current reaches 200 mA, while the beam waist radius contracts to a mere 1.09 mm. The normalized emittance, a crucial parameter, measures at &lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;1.536\times 10^{-{7}}~\text {m}\cdot \text {rad} &lt;/tex-math&gt;&lt;/inline-formula&gt;. Furthermore, stability analysis of the electron gun explores the influence of electrode potential on its performance. By co-regulating the bias voltage and the control voltage, the electron beam current can smoothly rise to 200 mA while maintaining the beam spot radius of 2 mm. This article indicates the tetrode electron gun's potential for precise control, thereby improving the quality and precision of high melting point alloy additive manufacturing processes.</description><subject>Anodes</subject><subject>Control electrode</subject><subject>electric field</subject><subject>Electric fields</subject><subject>Electric potential</subject><subject>electron beam additive manufacturing (EBAM)</subject><subject>Electron beams</subject><subject>electron gun</subject><subject>Electron guns</subject><subject>Electrons</subject><subject>Focusing</subject><issn>0093-3813</issn><issn>1939-9375</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpNkEtLA0EQhAdRMEbvHjzMH9jY89rZOcYYoxBRcD0vk56eMJJsZB8B_70bEtBTQ3VVQX2M3QqYCAHuvnz_mEiQeqK0dlAUZ2wknHKZU9acsxGAU5kqhLpkV237BSC0ATlicb4h7Jpd2_kuIX-kNq1rvovc87Kv_WpDvKThH4ifnDVf9DWPu-ZPeCC_5dMQUpf2xF993UePXd-kej007hPSNbuIftPSzemO2efTvJw9Z8u3xctsusxQaNtlXqPI84jBuIgSjDMYViaIaMmBsZ68Jo25sYXxKJUlG3IklChNHMSoxgyOvThMahuK1XeTtr75qQRUB07VwKk6cKpOnIbI3TGSiOifPS9AGq1-AZmUZeE</recordid><startdate>202407</startdate><enddate>202407</enddate><creator>Zhang, Zhenyi</creator><creator>Zhou, Zijian</creator><creator>Sheng, Keyan</creator><creator>Li, Haozhe</creator><creator>Xiong, Mianzhi</creator><creator>Xing, Jiangrui</creator><creator>Lin, Chunjiang</creator><creator>Huang, Jiang</creator><general>IEEE</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0009-0001-5933-9071</orcidid><orcidid>https://orcid.org/0000-0001-9379-496X</orcidid><orcidid>https://orcid.org/0000-0001-7401-7612</orcidid><orcidid>https://orcid.org/0000-0001-8959-325X</orcidid><orcidid>https://orcid.org/0000-0003-2764-7106</orcidid></search><sort><creationdate>202407</creationdate><title>Electrostatic Design of a Tunable Tetrode Electron Gun for Electron Beam Additive Manufacturing Device</title><author>Zhang, Zhenyi ; Zhou, Zijian ; Sheng, Keyan ; Li, Haozhe ; Xiong, Mianzhi ; Xing, Jiangrui ; Lin, Chunjiang ; Huang, Jiang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c147t-a4c166fcd59fc20595cdb5d1f7e9057aea4e4c65785ac237e7d6cec2c25f578f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Anodes</topic><topic>Control electrode</topic><topic>electric field</topic><topic>Electric fields</topic><topic>Electric potential</topic><topic>electron beam additive manufacturing (EBAM)</topic><topic>Electron beams</topic><topic>electron gun</topic><topic>Electron guns</topic><topic>Electrons</topic><topic>Focusing</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zhang, Zhenyi</creatorcontrib><creatorcontrib>Zhou, Zijian</creatorcontrib><creatorcontrib>Sheng, Keyan</creatorcontrib><creatorcontrib>Li, Haozhe</creatorcontrib><creatorcontrib>Xiong, Mianzhi</creatorcontrib><creatorcontrib>Xing, Jiangrui</creatorcontrib><creatorcontrib>Lin, Chunjiang</creatorcontrib><creatorcontrib>Huang, Jiang</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><jtitle>IEEE transactions on plasma science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Zhang, Zhenyi</au><au>Zhou, Zijian</au><au>Sheng, Keyan</au><au>Li, Haozhe</au><au>Xiong, Mianzhi</au><au>Xing, Jiangrui</au><au>Lin, Chunjiang</au><au>Huang, Jiang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrostatic Design of a Tunable Tetrode Electron Gun for Electron Beam Additive Manufacturing Device</atitle><jtitle>IEEE transactions on plasma science</jtitle><stitle>TPS</stitle><date>2024-07</date><risdate>2024</risdate><volume>52</volume><issue>7</issue><spage>2760</spage><epage>2765</epage><pages>2760-2765</pages><issn>0093-3813</issn><eissn>1939-9375</eissn><coden>ITPSBD</coden><abstract>The electron gun, as a critical device for emitting high-speed electrons, determines the electron beam current and quality in electron beam additive manufacturing (EBAM). In this article, a tetrode electron gun with a control electrode is designed to improve the quality and controllability of the electron beam. The control electrode, optimized by parametric simulation, provides secondary confinement of the electron beam. This confinement aims to reduce the beam spot size and emittance while decoupling spot size from the current. Specifically, the maximum attainable current reaches 200 mA, while the beam waist radius contracts to a mere 1.09 mm. The normalized emittance, a crucial parameter, measures at &lt;inline-formula&gt; &lt;tex-math notation="LaTeX"&gt;1.536\times 10^{-{7}}~\text {m}\cdot \text {rad} &lt;/tex-math&gt;&lt;/inline-formula&gt;. Furthermore, stability analysis of the electron gun explores the influence of electrode potential on its performance. By co-regulating the bias voltage and the control voltage, the electron beam current can smoothly rise to 200 mA while maintaining the beam spot radius of 2 mm. This article indicates the tetrode electron gun's potential for precise control, thereby improving the quality and precision of high melting point alloy additive manufacturing processes.</abstract><pub>IEEE</pub><doi>10.1109/TPS.2024.3449088</doi><tpages>6</tpages><orcidid>https://orcid.org/0009-0001-5933-9071</orcidid><orcidid>https://orcid.org/0000-0001-9379-496X</orcidid><orcidid>https://orcid.org/0000-0001-7401-7612</orcidid><orcidid>https://orcid.org/0000-0001-8959-325X</orcidid><orcidid>https://orcid.org/0000-0003-2764-7106</orcidid></addata></record>
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1939-9375
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subjects Anodes
Control electrode
electric field
Electric fields
Electric potential
electron beam additive manufacturing (EBAM)
Electron beams
electron gun
Electron guns
Electrons
Focusing
title Electrostatic Design of a Tunable Tetrode Electron Gun for Electron Beam Additive Manufacturing Device
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T10%3A02%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electrostatic%20Design%20of%20a%20Tunable%20Tetrode%20Electron%20Gun%20for%20Electron%20Beam%20Additive%20Manufacturing%20Device&rft.jtitle=IEEE%20transactions%20on%20plasma%20science&rft.au=Zhang,%20Zhenyi&rft.date=2024-07&rft.volume=52&rft.issue=7&rft.spage=2760&rft.epage=2765&rft.pages=2760-2765&rft.issn=0093-3813&rft.eissn=1939-9375&rft.coden=ITPSBD&rft_id=info:doi/10.1109/TPS.2024.3449088&rft_dat=%3Ccrossref_RIE%3E10_1109_TPS_2024_3449088%3C/crossref_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=10680254&rfr_iscdi=true