The influence of applied tensile stress on power loss in Co-rich amorphous Co-Fe-Si-B ribbons with induced magnetic anisotropy

The influence on power loss P T of applied tensile stress σ in amorphous (Co 0.89 Fe 0.11 ) 72 Mo 3 Si 15 B 10 ( \lambda_{s} > 0 ) and Co 73 Mo 2 Si 15 B 10 ( \lambda_{s} < 0 ) ribbons with different induced magnetic anisotropy K u is reported. The losses are measured under sinusoidal flux con...

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Veröffentlicht in:IEEE transactions on magnetics 1982-05, Vol.18 (3), p.904-907
Hauptverfasser: Nielsen, H., Nielsen, K., Nielsen, O.
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description The influence on power loss P T of applied tensile stress σ in amorphous (Co 0.89 Fe 0.11 ) 72 Mo 3 Si 15 B 10 ( \lambda_{s} > 0 ) and Co 73 Mo 2 Si 15 B 10 ( \lambda_{s} < 0 ) ribbons with different induced magnetic anisotropy K u is reported. The losses are measured under sinusoidal flux conditions at f = 50 Hz, J_{\max} = 0.57 T and at f = 400 Hz, J_{\max} = 0.10 T. Measurements are carried out on samples in a stress-relieved state and with magnetic anisotropies induced by stress or field annealing. At f = 50 Hz, a minimum m P t versus σ is observed. The σ-value ( \sigma_{\min} ) corresponding to the minimum P T increases with increasing |K u |. At f = 400 Hz, a minimum in P T versus σ is observed in the samples with induced magnetic anisotropy, whereas \sigma_{\min} = 0 in the stress-relieved samiales. However, no correlation between and \sigma_{\min} and K u is possible from the present data.
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The losses are measured under sinusoidal flux conditions at f = 50 Hz, J_{\max} = 0.57 T and at f = 400 Hz, J_{\max} = 0.10 T. Measurements are carried out on samples in a stress-relieved state and with magnetic anisotropies induced by stress or field annealing. At f = 50 Hz, a minimum m P t versus σ is observed. The σ-value ( \sigma_{\min} ) corresponding to the minimum P T increases with increasing |K u |. At f = 400 Hz, a minimum in P T versus σ is observed in the samples with induced magnetic anisotropy, whereas \sigma_{\min} = 0 in the stress-relieved samiales. 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The losses are measured under sinusoidal flux conditions at f = 50 Hz, J_{\max} = 0.57 T and at f = 400 Hz, J_{\max} = 0.10 T. Measurements are carried out on samples in a stress-relieved state and with magnetic anisotropies induced by stress or field annealing. At f = 50 Hz, a minimum m P t versus σ is observed. The σ-value ( \sigma_{\min} ) corresponding to the minimum P T increases with increasing |K u |. At f = 400 Hz, a minimum in P T versus σ is observed in the samples with induced magnetic anisotropy, whereas \sigma_{\min} = 0 in the stress-relieved samiales. However, no correlation between and \sigma_{\min} and K u is possible from the present data.</description><subject>Amorphous magnetic materials</subject><subject>Amorphous materials</subject><subject>Anisotropic magnetoresistance</subject><subject>Annealing</subject><subject>Magnetic analysis</subject><subject>Magnetic anisotropy</subject><subject>Magnetic fields</subject><subject>Magnetic flux</subject><subject>Perpendicular magnetic anisotropy</subject><subject>Tensile stress</subject><issn>0018-9464</issn><issn>1941-0069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1982</creationdate><recordtype>article</recordtype><recordid>eNpNUD1PwzAQtRBIlMIPQCye2FzsfDjxWCpakIoYKHPkOBdilNjBToS68NtxlA7ccKe7e-_p7iF0y-iKMSoeDq_r3YqJPFoxypmIxBlaMJEwQikX52hBKcuJSHhyia68_wptkjK6QL-HBrA2dTuCUYBtjWXftxoqPIDxugXsBwfeY2twb3_A4daGThu8scRp1WDZWdc3dvTTZAvkXZNH7HRZWuPxjx6aAK5GFRQ7-Wlg0ApLo70dnO2P1-iilq2Hm1Ndoo_t02HzTPZvu5fNek9UHGcDyVQIXtE0iSKg1ZRLqaoyl8BVXKZ1mgvJM1qrJMuYokmmMi5VxiCNVKXSeInuZ93e2e8R_FB02itoW2kgnF5EOeepYCIA2QxULvzpoC56pzvpjgWjxeR0MTldTE4XJ6cD527maAD4h5-3f_OWfJg</recordid><startdate>19820501</startdate><enddate>19820501</enddate><creator>Nielsen, H.</creator><creator>Nielsen, K.</creator><creator>Nielsen, O.</creator><general>IEEE</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>19820501</creationdate><title>The influence of applied tensile stress on power loss in Co-rich amorphous Co-Fe-Si-B ribbons with induced magnetic anisotropy</title><author>Nielsen, H. ; Nielsen, K. ; Nielsen, O.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c337t-7cccc6d05422e0d422ebacdb8ae6c3b5f589a670fc4771c047c76ac71e52cdc53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1982</creationdate><topic>Amorphous magnetic materials</topic><topic>Amorphous materials</topic><topic>Anisotropic magnetoresistance</topic><topic>Annealing</topic><topic>Magnetic analysis</topic><topic>Magnetic anisotropy</topic><topic>Magnetic fields</topic><topic>Magnetic flux</topic><topic>Perpendicular magnetic anisotropy</topic><topic>Tensile stress</topic><toplevel>online_resources</toplevel><creatorcontrib>Nielsen, H.</creatorcontrib><creatorcontrib>Nielsen, K.</creatorcontrib><creatorcontrib>Nielsen, O.</creatorcontrib><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on magnetics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Nielsen, H.</au><au>Nielsen, K.</au><au>Nielsen, O.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The influence of applied tensile stress on power loss in Co-rich amorphous Co-Fe-Si-B ribbons with induced magnetic anisotropy</atitle><jtitle>IEEE transactions on magnetics</jtitle><stitle>TMAG</stitle><date>1982-05-01</date><risdate>1982</risdate><volume>18</volume><issue>3</issue><spage>904</spage><epage>907</epage><pages>904-907</pages><issn>0018-9464</issn><eissn>1941-0069</eissn><coden>IEMGAQ</coden><abstract>The influence on power loss P T of applied tensile stress σ in amorphous (Co 0.89 Fe 0.11 ) 72 Mo 3 Si 15 B 10 ( \lambda_{s} &gt; 0 ) and Co 73 Mo 2 Si 15 B 10 ( \lambda_{s} &lt; 0 ) ribbons with different induced magnetic anisotropy K u is reported. The losses are measured under sinusoidal flux conditions at f = 50 Hz, J_{\max} = 0.57 T and at f = 400 Hz, J_{\max} = 0.10 T. Measurements are carried out on samples in a stress-relieved state and with magnetic anisotropies induced by stress or field annealing. At f = 50 Hz, a minimum m P t versus σ is observed. The σ-value ( \sigma_{\min} ) corresponding to the minimum P T increases with increasing |K u |. At f = 400 Hz, a minimum in P T versus σ is observed in the samples with induced magnetic anisotropy, whereas \sigma_{\min} = 0 in the stress-relieved samiales. However, no correlation between and \sigma_{\min} and K u is possible from the present data.</abstract><pub>IEEE</pub><doi>10.1109/TMAG.1982.1061929</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record>
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subjects Amorphous magnetic materials
Amorphous materials
Anisotropic magnetoresistance
Annealing
Magnetic analysis
Magnetic anisotropy
Magnetic fields
Magnetic flux
Perpendicular magnetic anisotropy
Tensile stress
title The influence of applied tensile stress on power loss in Co-rich amorphous Co-Fe-Si-B ribbons with induced magnetic anisotropy
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