Figures-of-Merit Study for Thermal Transient Measurement of SiC MOSFETs
Thermal transient measurement (TTM) utilizes temperature-sensitive electrical parameters (TSEP) to analyze the thermal structure of power semiconductor devices. However, the measured physical quantities are essentially electrical parameters rather than direct temperatures. Determining whether these...
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Veröffentlicht in: | IEEE transactions on power electronics 2024-09, Vol.39 (9), p.11583-11595 |
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creator | Zhang, Yi Zhang, Yichi Wong, Voon Hon Kalker, Sven Caruso, Antonio Ruppert, Lukas Iannuzzo, Francesco de Doncker, Rik W. |
description | Thermal transient measurement (TTM) utilizes temperature-sensitive electrical parameters (TSEP) to analyze the thermal structure of power semiconductor devices. However, the measured physical quantities are essentially electrical parameters rather than direct temperatures. Determining whether these measurements reflect correct temperature or thermal structure of the tested device remains unclear. This limitation becomes more pronounced with emerging silicon carbide (SiC) devices. To address this issue, this article provides a figures-of-merit (FOM) study for the TTM applied to SiC mosfet s. The FOM comprises three static and two dynamic factors. The proposed FOM is employed to evaluate ten plausible testing circuits of a SiC mosfet , where four of them are identified as providing reproducible thermal structures. A high-fidelity finite-volume method simulation is also used as a benchmark to validate the result. This study highlights some important facts, notably that successful TSEP calibration does not guarantee reproducible TTM, and compliance with current standards may also yield incorrect results. These insights hold significant implications for the field of SiC mosfet s and the future development of the TTM method. |
doi_str_mv | 10.1109/TPEL.2024.3382891 |
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However, the measured physical quantities are essentially electrical parameters rather than direct temperatures. Determining whether these measurements reflect correct temperature or thermal structure of the tested device remains unclear. This limitation becomes more pronounced with emerging silicon carbide (SiC) devices. To address this issue, this article provides a figures-of-merit (FOM) study for the TTM applied to SiC mosfet s. The FOM comprises three static and two dynamic factors. The proposed FOM is employed to evaluate ten plausible testing circuits of a SiC mosfet , where four of them are identified as providing reproducible thermal structures. A high-fidelity finite-volume method simulation is also used as a benchmark to validate the result. This study highlights some important facts, notably that successful TSEP calibration does not guarantee reproducible TTM, and compliance with current standards may also yield incorrect results. These insights hold significant implications for the field of SiC mosfet s and the future development of the TTM method.</description><identifier>ISSN: 0885-8993</identifier><identifier>EISSN: 1941-0107</identifier><identifier>DOI: 10.1109/TPEL.2024.3382891</identifier><identifier>CODEN: ITPEE8</identifier><language>eng</language><publisher>IEEE</publisher><subject>Calibration ; Cooling ; MOSFET ; Silicon carbide ; Silicon carbide (SiC) <sc xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">mosfet s ; Temperature measurement ; temperature-sensitive electrical parameters (TSEP) ; Testing ; thermal characterization ; Transient analysis ; transient thermal measurement (TTM)</subject><ispartof>IEEE transactions on power electronics, 2024-09, Vol.39 (9), p.11583-11595</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c218t-41e855963155c1bea86f78380829bc4d3db776ad1134a0c46a5fe3b3279d66e13</cites><orcidid>0000-0003-2269-7972 ; 0009-0001-8062-5312 ; 0000-0002-2698-6029 ; 0000-0001-6953-3858 ; 0000-0003-0248-7644 ; 0000-0002-7160-8430 ; 0009-0009-8669-3293 ; 0000-0003-3949-2172</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/10483537$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/10483537$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Zhang, Yi</creatorcontrib><creatorcontrib>Zhang, Yichi</creatorcontrib><creatorcontrib>Wong, Voon Hon</creatorcontrib><creatorcontrib>Kalker, Sven</creatorcontrib><creatorcontrib>Caruso, Antonio</creatorcontrib><creatorcontrib>Ruppert, Lukas</creatorcontrib><creatorcontrib>Iannuzzo, Francesco</creatorcontrib><creatorcontrib>de Doncker, Rik W.</creatorcontrib><title>Figures-of-Merit Study for Thermal Transient Measurement of SiC MOSFETs</title><title>IEEE transactions on power electronics</title><addtitle>TPEL</addtitle><description>Thermal transient measurement (TTM) utilizes temperature-sensitive electrical parameters (TSEP) to analyze the thermal structure of power semiconductor devices. However, the measured physical quantities are essentially electrical parameters rather than direct temperatures. Determining whether these measurements reflect correct temperature or thermal structure of the tested device remains unclear. This limitation becomes more pronounced with emerging silicon carbide (SiC) devices. To address this issue, this article provides a figures-of-merit (FOM) study for the TTM applied to SiC mosfet s. The FOM comprises three static and two dynamic factors. The proposed FOM is employed to evaluate ten plausible testing circuits of a SiC mosfet , where four of them are identified as providing reproducible thermal structures. A high-fidelity finite-volume method simulation is also used as a benchmark to validate the result. This study highlights some important facts, notably that successful TSEP calibration does not guarantee reproducible TTM, and compliance with current standards may also yield incorrect results. These insights hold significant implications for the field of SiC mosfet s and the future development of the TTM method.</description><subject>Calibration</subject><subject>Cooling</subject><subject>MOSFET</subject><subject>Silicon carbide</subject><subject>Silicon carbide (SiC) <sc xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">mosfet s</subject><subject>Temperature measurement</subject><subject>temperature-sensitive electrical parameters (TSEP)</subject><subject>Testing</subject><subject>thermal characterization</subject><subject>Transient analysis</subject><subject>transient thermal measurement (TTM)</subject><issn>0885-8993</issn><issn>1941-0107</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpNkM1OwzAQhC0EEqHwAEgc_AIu3qyd2EdU9QepVZEazpGTrCGoaZCdHvr2NGoPnGY0mpnDx9gzyCmAtK_Fx3w9TWWqpogmNRZuWAJWgZAg81uWSGO0MNbiPXuI8UdKUFpCwpaL9usYKIreiw2FduC74dicuO8DL74pdG7Pi-AOsaXDwDfk4rndjb73fNfO-Ga7W8yL-MjuvNtHerrqhH2e49lKrLfL99nbWtQpmEEoIKO1zRC0rqEiZzKfGzTSpLaqVYNNleeZawBQOVmrzGlPWGGa2ybLCHDC4PJbhz7GQL78DW3nwqkEWY4kypFEOZIoryTOm5fLpiWif31lUGOOf5IdWRI</recordid><startdate>20240901</startdate><enddate>20240901</enddate><creator>Zhang, Yi</creator><creator>Zhang, Yichi</creator><creator>Wong, Voon Hon</creator><creator>Kalker, Sven</creator><creator>Caruso, Antonio</creator><creator>Ruppert, Lukas</creator><creator>Iannuzzo, Francesco</creator><creator>de Doncker, Rik W.</creator><general>IEEE</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0003-2269-7972</orcidid><orcidid>https://orcid.org/0009-0001-8062-5312</orcidid><orcidid>https://orcid.org/0000-0002-2698-6029</orcidid><orcidid>https://orcid.org/0000-0001-6953-3858</orcidid><orcidid>https://orcid.org/0000-0003-0248-7644</orcidid><orcidid>https://orcid.org/0000-0002-7160-8430</orcidid><orcidid>https://orcid.org/0009-0009-8669-3293</orcidid><orcidid>https://orcid.org/0000-0003-3949-2172</orcidid></search><sort><creationdate>20240901</creationdate><title>Figures-of-Merit Study for Thermal Transient Measurement of SiC MOSFETs</title><author>Zhang, Yi ; Zhang, Yichi ; Wong, Voon Hon ; Kalker, Sven ; Caruso, Antonio ; Ruppert, Lukas ; Iannuzzo, Francesco ; de Doncker, Rik W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c218t-41e855963155c1bea86f78380829bc4d3db776ad1134a0c46a5fe3b3279d66e13</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Calibration</topic><topic>Cooling</topic><topic>MOSFET</topic><topic>Silicon carbide</topic><topic>Silicon carbide (SiC) <sc xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">mosfet s</topic><topic>Temperature measurement</topic><topic>temperature-sensitive electrical parameters (TSEP)</topic><topic>Testing</topic><topic>thermal characterization</topic><topic>Transient analysis</topic><topic>transient thermal measurement (TTM)</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zhang, Yi</creatorcontrib><creatorcontrib>Zhang, Yichi</creatorcontrib><creatorcontrib>Wong, Voon Hon</creatorcontrib><creatorcontrib>Kalker, Sven</creatorcontrib><creatorcontrib>Caruso, Antonio</creatorcontrib><creatorcontrib>Ruppert, Lukas</creatorcontrib><creatorcontrib>Iannuzzo, Francesco</creatorcontrib><creatorcontrib>de Doncker, Rik W.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><jtitle>IEEE transactions on power electronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Zhang, Yi</au><au>Zhang, Yichi</au><au>Wong, Voon Hon</au><au>Kalker, Sven</au><au>Caruso, Antonio</au><au>Ruppert, Lukas</au><au>Iannuzzo, Francesco</au><au>de Doncker, Rik W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Figures-of-Merit Study for Thermal Transient Measurement of SiC MOSFETs</atitle><jtitle>IEEE transactions on power electronics</jtitle><stitle>TPEL</stitle><date>2024-09-01</date><risdate>2024</risdate><volume>39</volume><issue>9</issue><spage>11583</spage><epage>11595</epage><pages>11583-11595</pages><issn>0885-8993</issn><eissn>1941-0107</eissn><coden>ITPEE8</coden><abstract>Thermal transient measurement (TTM) utilizes temperature-sensitive electrical parameters (TSEP) to analyze the thermal structure of power semiconductor devices. However, the measured physical quantities are essentially electrical parameters rather than direct temperatures. Determining whether these measurements reflect correct temperature or thermal structure of the tested device remains unclear. This limitation becomes more pronounced with emerging silicon carbide (SiC) devices. To address this issue, this article provides a figures-of-merit (FOM) study for the TTM applied to SiC mosfet s. The FOM comprises three static and two dynamic factors. The proposed FOM is employed to evaluate ten plausible testing circuits of a SiC mosfet , where four of them are identified as providing reproducible thermal structures. A high-fidelity finite-volume method simulation is also used as a benchmark to validate the result. This study highlights some important facts, notably that successful TSEP calibration does not guarantee reproducible TTM, and compliance with current standards may also yield incorrect results. These insights hold significant implications for the field of SiC mosfet s and the future development of the TTM method.</abstract><pub>IEEE</pub><doi>10.1109/TPEL.2024.3382891</doi><tpages>13</tpages><orcidid>https://orcid.org/0000-0003-2269-7972</orcidid><orcidid>https://orcid.org/0009-0001-8062-5312</orcidid><orcidid>https://orcid.org/0000-0002-2698-6029</orcidid><orcidid>https://orcid.org/0000-0001-6953-3858</orcidid><orcidid>https://orcid.org/0000-0003-0248-7644</orcidid><orcidid>https://orcid.org/0000-0002-7160-8430</orcidid><orcidid>https://orcid.org/0009-0009-8669-3293</orcidid><orcidid>https://orcid.org/0000-0003-3949-2172</orcidid></addata></record> |
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subjects | Calibration Cooling MOSFET Silicon carbide Silicon carbide (SiC) <sc xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">mosfet s Temperature measurement temperature-sensitive electrical parameters (TSEP) Testing thermal characterization Transient analysis transient thermal measurement (TTM) |
title | Figures-of-Merit Study for Thermal Transient Measurement of SiC MOSFETs |
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