Patterning magnetic antidot-type arrays by Ga/sup +/ implantation

Summary form only given. By defining a periodic array of square holes into a continuous ferromagnetic film an antidot array is formed. In this way the magnetisation reversal process and domain structure can be significantly changed. In these structures isolated domain states that could represent rec...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Owen, N.W., Hang-Yan Yuen, Petford-Long, A.K.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page BC11
container_title
container_volume
creator Owen, N.W.
Hang-Yan Yuen
Petford-Long, A.K.
description Summary form only given. By defining a periodic array of square holes into a continuous ferromagnetic film an antidot array is formed. In this way the magnetisation reversal process and domain structure can be significantly changed. In these structures isolated domain states that could represent recorded bits have been observed at remanence trapped above and below antidots during hard axis magnetisation reversal. Milling holes using a focused ion beam (FIB) system is slow and reduces the integrity of the films. Here an alternative means to fabricate an antidot array by changing the magnetic properties of thin film NiFe through Ga/sup +/ implantation is outlined.
doi_str_mv 10.1109/INTMAG.2002.1000799
format Conference Proceeding
fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_1000799</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1000799</ieee_id><sourcerecordid>1000799</sourcerecordid><originalsourceid>FETCH-ieee_primary_10007993</originalsourceid><addsrcrecordid>eNp9jr0OgjAURpsYE43yBCzdDXALVOxIjH-DxoGdXLWSGihNWwfeXgZmk5N8w_mGQ0jIIGYMRHK5VdfyFKcAacwAoBBiRgJR7GAkK7It5wsSOPcZHeQ5TwVfkvKO3kurlW5oh42WXj0paq9evY_8YCRFa3Fw9DHQEybua-gmoaoz7XhCr3q9JvM3tk4G065IeDxU-3OkpJS1sapDO9RTUPbf_gDhNTos</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Patterning magnetic antidot-type arrays by Ga/sup +/ implantation</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Owen, N.W. ; Hang-Yan Yuen ; Petford-Long, A.K.</creator><creatorcontrib>Owen, N.W. ; Hang-Yan Yuen ; Petford-Long, A.K.</creatorcontrib><description>Summary form only given. By defining a periodic array of square holes into a continuous ferromagnetic film an antidot array is formed. In this way the magnetisation reversal process and domain structure can be significantly changed. In these structures isolated domain states that could represent recorded bits have been observed at remanence trapped above and below antidots during hard axis magnetisation reversal. Milling holes using a focused ion beam (FIB) system is slow and reduces the integrity of the films. Here an alternative means to fabricate an antidot array by changing the magnetic properties of thin film NiFe through Ga/sup +/ implantation is outlined.</description><identifier>ISBN: 9780780373655</identifier><identifier>ISBN: 0780373650</identifier><identifier>DOI: 10.1109/INTMAG.2002.1000799</identifier><language>eng</language><publisher>IEEE</publisher><subject>Anisotropic magnetoresistance ; Ion beams ; Magnetic films ; Magnetic hysteresis ; Magnetic materials ; Magnetic properties ; Magnetization reversal ; Magnets ; Milling ; Remanence</subject><ispartof>IEEE International Digest of Technical Papers on Magnetics Conference, 2002, p.BC11</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1000799$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,2051,4035,4036,27904,54898</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1000799$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Owen, N.W.</creatorcontrib><creatorcontrib>Hang-Yan Yuen</creatorcontrib><creatorcontrib>Petford-Long, A.K.</creatorcontrib><title>Patterning magnetic antidot-type arrays by Ga/sup +/ implantation</title><title>IEEE International Digest of Technical Papers on Magnetics Conference</title><addtitle>INTMAG</addtitle><description>Summary form only given. By defining a periodic array of square holes into a continuous ferromagnetic film an antidot array is formed. In this way the magnetisation reversal process and domain structure can be significantly changed. In these structures isolated domain states that could represent recorded bits have been observed at remanence trapped above and below antidots during hard axis magnetisation reversal. Milling holes using a focused ion beam (FIB) system is slow and reduces the integrity of the films. Here an alternative means to fabricate an antidot array by changing the magnetic properties of thin film NiFe through Ga/sup +/ implantation is outlined.</description><subject>Anisotropic magnetoresistance</subject><subject>Ion beams</subject><subject>Magnetic films</subject><subject>Magnetic hysteresis</subject><subject>Magnetic materials</subject><subject>Magnetic properties</subject><subject>Magnetization reversal</subject><subject>Magnets</subject><subject>Milling</subject><subject>Remanence</subject><isbn>9780780373655</isbn><isbn>0780373650</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2002</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNp9jr0OgjAURpsYE43yBCzdDXALVOxIjH-DxoGdXLWSGihNWwfeXgZmk5N8w_mGQ0jIIGYMRHK5VdfyFKcAacwAoBBiRgJR7GAkK7It5wsSOPcZHeQ5TwVfkvKO3kurlW5oh42WXj0paq9evY_8YCRFa3Fw9DHQEybua-gmoaoz7XhCr3q9JvM3tk4G065IeDxU-3OkpJS1sapDO9RTUPbf_gDhNTos</recordid><startdate>2002</startdate><enddate>2002</enddate><creator>Owen, N.W.</creator><creator>Hang-Yan Yuen</creator><creator>Petford-Long, A.K.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>2002</creationdate><title>Patterning magnetic antidot-type arrays by Ga/sup +/ implantation</title><author>Owen, N.W. ; Hang-Yan Yuen ; Petford-Long, A.K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_10007993</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2002</creationdate><topic>Anisotropic magnetoresistance</topic><topic>Ion beams</topic><topic>Magnetic films</topic><topic>Magnetic hysteresis</topic><topic>Magnetic materials</topic><topic>Magnetic properties</topic><topic>Magnetization reversal</topic><topic>Magnets</topic><topic>Milling</topic><topic>Remanence</topic><toplevel>online_resources</toplevel><creatorcontrib>Owen, N.W.</creatorcontrib><creatorcontrib>Hang-Yan Yuen</creatorcontrib><creatorcontrib>Petford-Long, A.K.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Owen, N.W.</au><au>Hang-Yan Yuen</au><au>Petford-Long, A.K.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Patterning magnetic antidot-type arrays by Ga/sup +/ implantation</atitle><btitle>IEEE International Digest of Technical Papers on Magnetics Conference</btitle><stitle>INTMAG</stitle><date>2002</date><risdate>2002</risdate><spage>BC11</spage><pages>BC11-</pages><isbn>9780780373655</isbn><isbn>0780373650</isbn><abstract>Summary form only given. By defining a periodic array of square holes into a continuous ferromagnetic film an antidot array is formed. In this way the magnetisation reversal process and domain structure can be significantly changed. In these structures isolated domain states that could represent recorded bits have been observed at remanence trapped above and below antidots during hard axis magnetisation reversal. Milling holes using a focused ion beam (FIB) system is slow and reduces the integrity of the films. Here an alternative means to fabricate an antidot array by changing the magnetic properties of thin film NiFe through Ga/sup +/ implantation is outlined.</abstract><pub>IEEE</pub><doi>10.1109/INTMAG.2002.1000799</doi></addata></record>
fulltext fulltext_linktorsrc
identifier ISBN: 9780780373655
ispartof IEEE International Digest of Technical Papers on Magnetics Conference, 2002, p.BC11
issn
language eng
recordid cdi_ieee_primary_1000799
source IEEE Electronic Library (IEL) Conference Proceedings
subjects Anisotropic magnetoresistance
Ion beams
Magnetic films
Magnetic hysteresis
Magnetic materials
Magnetic properties
Magnetization reversal
Magnets
Milling
Remanence
title Patterning magnetic antidot-type arrays by Ga/sup +/ implantation
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T23%3A43%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Patterning%20magnetic%20antidot-type%20arrays%20by%20Ga/sup%20+/%20implantation&rft.btitle=IEEE%20International%20Digest%20of%20Technical%20Papers%20on%20Magnetics%20Conference&rft.au=Owen,%20N.W.&rft.date=2002&rft.spage=BC11&rft.pages=BC11-&rft.isbn=9780780373655&rft.isbn_list=0780373650&rft_id=info:doi/10.1109/INTMAG.2002.1000799&rft_dat=%3Cieee_6IE%3E1000799%3C/ieee_6IE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1000799&rfr_iscdi=true