Carbon Incorporation in MOCVD of MoS 2 Thin Films Grown from an Organosulfide Precursor

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Veröffentlicht in:	Chemistry of materials 2021-06, Vol.33 (12), p.4474-4487
Hauptverfasser:	Schaefer, Christian M., Caicedo Roque, José M., Sauthier, Guillaume, Bousquet, Jessica, Hébert, Clément, Sperling, Justin R., Pérez-Tomás, Amador, Santiso, José, del Corro, Elena, Garrido, Jose A.
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Sprache:	eng
Schlagworte:	Engineering Sciences
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doi_str_mv	10.1021/acs.chemmater.1c00646
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title	Carbon Incorporation in MOCVD of MoS 2 Thin Films Grown from an Organosulfide Precursor
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