Molecular Diodes Induced by a Schottky Barrier with a Gold–Silicon Doped Electrode

To create complementary metal oxide semiconductor compatible molecular devices, more insights into the electrode property regarding its metal/semiconductor doping level and creating a functional molecular device are required. In this work, we constructed an EGaIn/alkanethiol/Au–Si molecular diode (w...

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Veröffentlicht in:The journal of physical chemistry letters 2024-07, Vol.15 (27), p.7011-7019
Hauptverfasser: Wu, An, Fan, Yidan, Tao, Changyuan, Chen, Xiaoping, Dappe, Yannick J., Du, Jun, Zhang, Qian
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container_end_page 7019
container_issue 27
container_start_page 7011
container_title The journal of physical chemistry letters
container_volume 15
creator Wu, An
Fan, Yidan
Tao, Changyuan
Chen, Xiaoping
Dappe, Yannick J.
Du, Jun
Zhang, Qian
description To create complementary metal oxide semiconductor compatible molecular devices, more insights into the electrode property regarding its metal/semiconductor doping level and creating a functional molecular device are required. In this work, we constructed an EGaIn/alkanethiol/Au–Si molecular diode (with a rectification ratio R of 50.70) induced by Schottky barriers within a gold–silicon doped electrode instead of the functional property of molecules. The relationship between the rectification ratio and the number of methylene units in alkanethiol was analyzed, revealing a gradual increase in the ratio from 3.33 for C6H14S to 50.70 for C16H34S. The rectification ratio of the junction is well modulated by the temperature due to the change in the Schottky barrier. Such a mechanism is explained by the energy band diagrams of the surface space charge region and a combination of density functional theory and Keldysh–Green formalism calculations.
doi_str_mv 10.1021/acs.jpclett.4c01351
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Physics
title Molecular Diodes Induced by a Schottky Barrier with a Gold–Silicon Doped Electrode
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