Investigation structural heterogeneities in hydrogenated nanocrystalline silicon thin films from argon-diluted silane dusty plasma PECVD

This study presents a novel approach for achieving a high deposition rate of nanocrystalline hydrogenated silicon (nc-Si:H) thin films using dusty plasma, eliminating the need for hydrogen dilution. Contrary to conventional beliefs, the research demonstrates that crystalline seeds can nucleate direc...

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Veröffentlicht in:	Vacuum 2024-11, Vol.229, p.113568, Article 113568
Hauptverfasser:	Amrani, Rachid, Lekoui, Fouaz, Pichot, Frederic, Annou, Kamal, Abboud, Pascale, Garoudja, Elyes, Filali, Walid, Oussalah, Slimane, Cuminal, Yvan
Format:	Artikel
Sprache:	eng
Schlagworte:	Conical growth Controlled microstructures Crystallinity Dusty plasma Engineering Sciences Grain size variation Material properties PECVD Powders Silicon thin films Structural inhomogeneities
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