Fabrication and Characterization of Boron-Implanted Silicon Superconducting Thin Films on SOI Substrates for Low-Temperature Detectors

In this paper, we discuss the characterization of boron-doped silicon superconducting thin films with a thickness of 70 nm made on silicon-on-insulator substrates by ion implantation and ultra-violet nanosecond laser annealing under nitrogen at atmospheric pressure. Two different ion-implanted doses...

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