Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry
A two-dimensional hybrid model is used to simulate an industrial dual-frequency capacitively coupled plasma reactor working at closely spaced frequencies (13.56–40.68 MHz) in pure CF4 chemistry. The goal is to understand how plasma operating conditions (pressure, low-frequency and high-frequency RF...
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Veröffentlicht in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2024-01, Vol.42 (1) |
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Sprache: | eng |
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