Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry

A two-dimensional hybrid model is used to simulate an industrial dual-frequency capacitively coupled plasma reactor working at closely spaced frequencies (13.56–40.68 MHz) in pure CF4 chemistry. The goal is to understand how plasma operating conditions (pressure, low-frequency and high-frequency RF...

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Veröffentlicht in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2024-01, Vol.42 (1)
Hauptverfasser: Ducluzaux, Pierre, Ristoiu, Delia, Cunge, Gilles, Despiau-Pujo, Emilie
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Sprache:eng
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