Effect of Co, Pd and Pt ultra-thin films on the Ni-silicide formation: investigating the sandwich configuration

The effect of Co, Pd and Pt ultrathin films on the kinetics of the formation of Ni-silicide by reactive diffusion is investigated. 50 nm Ni/1 nm X/ 50 nm Ni (X = Co, Pd, Pt) deposited on Si(100) substrates are studied using in-situ and ex-situ measurements by X-ray diffraction (XRD). The presence of...

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Veröffentlicht in:	Journal of materials science 2022-03, Vol.57 (10), p.5894-5912
Hauptverfasser:	Quertite, Khalid, Gao, Jianbao, Descoins, Marion, Bertoglio, Maxime, Girardeaux, Christophe, Mangelinck, Dominique
Format:	Artikel
Sprache:	eng
Schlagworte:	Characterization and Evaluation of Materials Chemical Sciences Chemistry and Materials Science Classical Mechanics Cobalt Comparative analysis Crystallography and Scattering Methods Dielectric films Diffraction Diffusion barriers Diffusion layers Electronic Materials Intermetallic compounds Investigations Kinetics Material chemistry Materials Science Nickel silicide Palladium Platinum Polymer Sciences Silicon compounds Silicon substrates Solid Mechanics Thin films X-ray diffraction X-rays
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