Inter-diffusion of cobalt and silicon through an ultra thin aluminum oxide layer

Optical emission spectroscopy of sputtered species during ion bombardment, Auger electron spectroscopy and high-resolution transmission electron microscopy were used to study the cobalt and silicon diffusion through the interfaces of Co/AlO/Si(0 0 1) hetero-structure. The results are discussed as a...

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Veröffentlicht in:	Applied surface science 2010-02, Vol.256 (9), p.2731-2734
Hauptverfasser:	El Asri, T., Raissi, M., Vizzini, S., Maachi, A. El, Ameziane, E.L., d’Avitaya, F. Arnaud, Lazzari, J.-L., Coudreau, C., Oughaddou, H., Aufray, B., Kaddouri, A.
Format:	Artikel
Sprache:	eng
Schlagworte:	AES Aluminum oxide layer Astrophysics Cobalt Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Diffusion Exact sciences and technology HR-TEM MIS structure Physics Silicon SIPS
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