Structural investigation of thin films of Ti1-xAlxN ternary nitrides using Ti K-edge X-ray absorption fine structure

Thin films of Ti1-xAlxN nitrides were prepared over a large range of composition (0 < =x < 1) on Si substrates using nitrogen reactive magnetron sputtering from composite metallic targets. Ti K-edge X-ray Absorption Spectroscopy experiments were carried for a better understanding of the local...

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Veröffentlicht in:	Surface & coatings technology 2007-01, Vol.201 (8), p.4536-4541
Hauptverfasser:	TUILIER, M.-H, PAC, M.-J, COVAREL, G, ROUSSELOT, C, KHOUCHAF, L
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Cross-disciplinary physics: materials science rheology Engineering Sciences Exact sciences and technology Materials Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Other topics in materials science Physics Production techniques Surface treatment
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