Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates
Pure rutile Co-doped TiO2 films were fabricated by the pulsed-laser-deposition technique on silicon substrates from a ceramic target. Under the right fabrication conditions, Co concentration in the films could be almost the same as in the target, and films under various conditions all are ferromagne...
Gespeichert in:
Veröffentlicht in: | Applied physics letters 2003-10, Vol.83 (15), p.3129-3131 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 3131 |
---|---|
container_issue | 15 |
container_start_page | 3129 |
container_title | Applied physics letters |
container_volume | 83 |
creator | Hong, Nguyen Hoa Sakai, Joe Prellier, W. Hassini, Awatef |
description | Pure rutile Co-doped TiO2 films were fabricated by the pulsed-laser-deposition technique on silicon substrates from a ceramic target. Under the right fabrication conditions, Co concentration in the films could be almost the same as in the target, and films under various conditions all are ferromagnetic well above room temperature. Even though Rutherford backscattering spectroscopy measurements show that Co atoms mostly localize near the surface of the films and exist less in deeper levels, other experimental evidence shows that the ferromagnetism does not come from Co segregations, but from the Co-doped TiO2 matrix. Rutile Ti1−xCoxO2 thin films grown by a very simple technique on low-cost silicon substrates showing a Curie temperature (TC) above 400 K appear to be very attractive to applications. |
doi_str_mv | 10.1063/1.1619227 |
format | Article |
fullrecord | <record><control><sourceid>hal_cross</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_03544342v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>oai_HAL_hal_03544342v1</sourcerecordid><originalsourceid>FETCH-LOGICAL-c261t-ff33e7261a0c96575c23cc81c532c320deb02de84a60da2d5ae2888e97d217013</originalsourceid><addsrcrecordid>eNpNUMtqwzAQFKWFpmkP_QNde3Cq1dqWfQymLwjkkp6FLMmJimIFyWnJ39duQykszO4wOwNDyD2wBbASH2EBJdSciwsyAyZEhgDVJZkxxjAr6wKuyU1KH-NZcMQZ6ZtAjUtDdO1xcKGnrqedjTHs1ba3g9M0jry3tAmZCQdr6MatOR12k875faLbGL562p6oV8lGqlqvfozGSc47PeGxHRPUYNMtueqUT_bujHPy_vy0aV6z1frlrVmuMs1LGLKuQ7RiXBXTdVmIQnPUugJdINfImbEt48ZWuSqZUdwUyvKqqmwtDAfBAOfk4dd3p7w8RLdX8SSDcvJ1uZITx7DIc8z55z-tjiGlaLu_B2ByKlWCPJeK34xVaVA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates</title><source>AIP Journals Complete</source><source>AIP Digital Archive</source><creator>Hong, Nguyen Hoa ; Sakai, Joe ; Prellier, W. ; Hassini, Awatef</creator><creatorcontrib>Hong, Nguyen Hoa ; Sakai, Joe ; Prellier, W. ; Hassini, Awatef</creatorcontrib><description>Pure rutile Co-doped TiO2 films were fabricated by the pulsed-laser-deposition technique on silicon substrates from a ceramic target. Under the right fabrication conditions, Co concentration in the films could be almost the same as in the target, and films under various conditions all are ferromagnetic well above room temperature. Even though Rutherford backscattering spectroscopy measurements show that Co atoms mostly localize near the surface of the films and exist less in deeper levels, other experimental evidence shows that the ferromagnetism does not come from Co segregations, but from the Co-doped TiO2 matrix. Rutile Ti1−xCoxO2 thin films grown by a very simple technique on low-cost silicon substrates showing a Curie temperature (TC) above 400 K appear to be very attractive to applications.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.1619227</identifier><language>eng</language><publisher>American Institute of Physics</publisher><subject>Chemical Sciences ; Material chemistry ; Physics</subject><ispartof>Applied physics letters, 2003-10, Vol.83 (15), p.3129-3131</ispartof><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c261t-ff33e7261a0c96575c23cc81c532c320deb02de84a60da2d5ae2888e97d217013</citedby><cites>FETCH-LOGICAL-c261t-ff33e7261a0c96575c23cc81c532c320deb02de84a60da2d5ae2888e97d217013</cites><orcidid>0000-0002-1492-2837 ; 0000-0001-7688-0655</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,881,27901,27902</link.rule.ids><backlink>$$Uhttps://normandie-univ.hal.science/hal-03544342$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Hong, Nguyen Hoa</creatorcontrib><creatorcontrib>Sakai, Joe</creatorcontrib><creatorcontrib>Prellier, W.</creatorcontrib><creatorcontrib>Hassini, Awatef</creatorcontrib><title>Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates</title><title>Applied physics letters</title><description>Pure rutile Co-doped TiO2 films were fabricated by the pulsed-laser-deposition technique on silicon substrates from a ceramic target. Under the right fabrication conditions, Co concentration in the films could be almost the same as in the target, and films under various conditions all are ferromagnetic well above room temperature. Even though Rutherford backscattering spectroscopy measurements show that Co atoms mostly localize near the surface of the films and exist less in deeper levels, other experimental evidence shows that the ferromagnetism does not come from Co segregations, but from the Co-doped TiO2 matrix. Rutile Ti1−xCoxO2 thin films grown by a very simple technique on low-cost silicon substrates showing a Curie temperature (TC) above 400 K appear to be very attractive to applications.</description><subject>Chemical Sciences</subject><subject>Material chemistry</subject><subject>Physics</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNpNUMtqwzAQFKWFpmkP_QNde3Cq1dqWfQymLwjkkp6FLMmJimIFyWnJ39duQykszO4wOwNDyD2wBbASH2EBJdSciwsyAyZEhgDVJZkxxjAr6wKuyU1KH-NZcMQZ6ZtAjUtDdO1xcKGnrqedjTHs1ba3g9M0jry3tAmZCQdr6MatOR12k875faLbGL562p6oV8lGqlqvfozGSc47PeGxHRPUYNMtueqUT_bujHPy_vy0aV6z1frlrVmuMs1LGLKuQ7RiXBXTdVmIQnPUugJdINfImbEt48ZWuSqZUdwUyvKqqmwtDAfBAOfk4dd3p7w8RLdX8SSDcvJ1uZITx7DIc8z55z-tjiGlaLu_B2ByKlWCPJeK34xVaVA</recordid><startdate>20031013</startdate><enddate>20031013</enddate><creator>Hong, Nguyen Hoa</creator><creator>Sakai, Joe</creator><creator>Prellier, W.</creator><creator>Hassini, Awatef</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>1XC</scope><orcidid>https://orcid.org/0000-0002-1492-2837</orcidid><orcidid>https://orcid.org/0000-0001-7688-0655</orcidid></search><sort><creationdate>20031013</creationdate><title>Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates</title><author>Hong, Nguyen Hoa ; Sakai, Joe ; Prellier, W. ; Hassini, Awatef</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c261t-ff33e7261a0c96575c23cc81c532c320deb02de84a60da2d5ae2888e97d217013</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Chemical Sciences</topic><topic>Material chemistry</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hong, Nguyen Hoa</creatorcontrib><creatorcontrib>Sakai, Joe</creatorcontrib><creatorcontrib>Prellier, W.</creatorcontrib><creatorcontrib>Hassini, Awatef</creatorcontrib><collection>CrossRef</collection><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hong, Nguyen Hoa</au><au>Sakai, Joe</au><au>Prellier, W.</au><au>Hassini, Awatef</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates</atitle><jtitle>Applied physics letters</jtitle><date>2003-10-13</date><risdate>2003</risdate><volume>83</volume><issue>15</issue><spage>3129</spage><epage>3131</epage><pages>3129-3131</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>Pure rutile Co-doped TiO2 films were fabricated by the pulsed-laser-deposition technique on silicon substrates from a ceramic target. Under the right fabrication conditions, Co concentration in the films could be almost the same as in the target, and films under various conditions all are ferromagnetic well above room temperature. Even though Rutherford backscattering spectroscopy measurements show that Co atoms mostly localize near the surface of the films and exist less in deeper levels, other experimental evidence shows that the ferromagnetism does not come from Co segregations, but from the Co-doped TiO2 matrix. Rutile Ti1−xCoxO2 thin films grown by a very simple technique on low-cost silicon substrates showing a Curie temperature (TC) above 400 K appear to be very attractive to applications.</abstract><pub>American Institute of Physics</pub><doi>10.1063/1.1619227</doi><tpages>3</tpages><orcidid>https://orcid.org/0000-0002-1492-2837</orcidid><orcidid>https://orcid.org/0000-0001-7688-0655</orcidid></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0003-6951 |
ispartof | Applied physics letters, 2003-10, Vol.83 (15), p.3129-3131 |
issn | 0003-6951 1077-3118 |
language | eng |
recordid | cdi_hal_primary_oai_HAL_hal_03544342v1 |
source | AIP Journals Complete; AIP Digital Archive |
subjects | Chemical Sciences Material chemistry Physics |
title | Co distribution in ferromagnetic rutile Co-doped TiO2 thin films grown by laser ablation on silicon substrates |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T12%3A50%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-hal_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Co%20distribution%20in%20ferromagnetic%20rutile%20Co-doped%20TiO2%20thin%20films%20grown%20by%20laser%20ablation%20on%20silicon%20substrates&rft.jtitle=Applied%20physics%20letters&rft.au=Hong,%20Nguyen%20Hoa&rft.date=2003-10-13&rft.volume=83&rft.issue=15&rft.spage=3129&rft.epage=3131&rft.pages=3129-3131&rft.issn=0003-6951&rft.eissn=1077-3118&rft_id=info:doi/10.1063/1.1619227&rft_dat=%3Chal_cross%3Eoai_HAL_hal_03544342v1%3C/hal_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |