Can impostors thrive at work? The impostor phenomenon's role in work and career outcomes
This paper examines the effect the impostor phenomenon (IP) on short-term emotions (shame) and performance (creativity and organizational citizenship behavior- OCB) at work, and on career outcomes. Previous research shows direct detrimental effects of IP on some short-term performance measures, but...
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Veröffentlicht in: | IDEAS Working Paper Series from RePEc 2021-08, Vol.128, p.103601, Article 103601 |
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description | This paper examines the effect the impostor phenomenon (IP) on short-term emotions (shame) and performance (creativity and organizational citizenship behavior- OCB) at work, and on career outcomes. Previous research shows direct detrimental effects of IP on some short-term performance measures, but effects on creativity and OCB remain under-researched, and no work has investigated any career effects. Through an experimental approach (Studies 1 and 3) and an online vignette (Study 2) using working populations, we find that IP is expressed as shame in response to simulated and recalled real work events. Shame mediates the negative effect of IP on creativity, and its positive effect on OCB, and mechanistic organizational structure exacerbates the negative shame-creativity relationship. Furthermore, Study 4 uses a survey design to reveal that IP relates negatively to external employability and career success. Drawing on conservation of resources theory, we suggest that IP and shame deplete resources such that impostors suffer reduced ability to perform well at work in the short-term, with negative consequences for career success.
•Shame mediates the negative relationship between IP and creativity.•Impostors experiencing shame show increased OCB, to mitigate feelings of shame and the threatened self.•IP has a negative effect on external employability and career success.•IP and shame deplete personal resources leading to detrimental work effects and career outcomes. |
doi_str_mv | 10.1016/j.jvb.2021.103601 |
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fullrecord | <record><control><sourceid>proquest_hal_p</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_03330558v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0001879121000737</els_id><sourcerecordid>2553565204</sourcerecordid><originalsourceid>FETCH-LOGICAL-c430t-bcd47ca616abbecac537833826142cc33617b422ae2a71f3ddefc5a844b627ca3</originalsourceid><addsrcrecordid>eNp9kU9LwzAYxoMoOKcfwFvAg3jozP9meJAx1AkDLxO8hTRNaevW1KSr-O1Nrey4Qwhvnt_z5uV9ALjGaIYRFvf1rO6zGUEEx5oKhE_ABKM5T-ZIslMwQQjhRKZzfA4uQqhjKbFMJ-BjqRtY7VoXOucD7Epf9RbqDn47__kIN6U9qLAtbeN28TS3AXq3jVLzx0Hd5NBob62Hbt-ZCIVLcFbobbBX__cUvD8_bZarZP328rpcrBPDKOqSzOQsNVpgobPMGm04TSWlkgjMiDGUCpxmjBBtiU5xQfPcFoZryVgmSDTSKbgb-5Z6q1pf7bT_UU5XarVYq-ENUUoR57LHkb0Z2da7r70Nnard3jdxPEW45JLNhWDHKU654AQNFB4p410I3haHzzFSQySqVjESNUSixkii52H02LiQvrJeBVPZxti88tZ0KnfVEfcvqqCSWQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2585849664</pqid></control><display><type>article</type><title>Can impostors thrive at work? The impostor phenomenon's role in work and career outcomes</title><source>Elsevier ScienceDirect Journals</source><creator>Hudson, Sarah ; González-Gómez, Helena V.</creator><creatorcontrib>Hudson, Sarah ; González-Gómez, Helena V.</creatorcontrib><description>This paper examines the effect the impostor phenomenon (IP) on short-term emotions (shame) and performance (creativity and organizational citizenship behavior- OCB) at work, and on career outcomes. Previous research shows direct detrimental effects of IP on some short-term performance measures, but effects on creativity and OCB remain under-researched, and no work has investigated any career effects. Through an experimental approach (Studies 1 and 3) and an online vignette (Study 2) using working populations, we find that IP is expressed as shame in response to simulated and recalled real work events. Shame mediates the negative effect of IP on creativity, and its positive effect on OCB, and mechanistic organizational structure exacerbates the negative shame-creativity relationship. Furthermore, Study 4 uses a survey design to reveal that IP relates negatively to external employability and career success. Drawing on conservation of resources theory, we suggest that IP and shame deplete resources such that impostors suffer reduced ability to perform well at work in the short-term, with negative consequences for career success.
•Shame mediates the negative relationship between IP and creativity.•Impostors experiencing shame show increased OCB, to mitigate feelings of shame and the threatened self.•IP has a negative effect on external employability and career success.•IP and shame deplete personal resources leading to detrimental work effects and career outcomes.</description><identifier>ISSN: 0001-8791</identifier><identifier>EISSN: 1095-9084</identifier><identifier>DOI: 10.1016/j.jvb.2021.103601</identifier><language>eng</language><publisher>Philadelphia: Elsevier Inc</publisher><subject>Business administration ; Career development planning ; Career success ; Careers ; Conservation of resources theory ; Creativity ; Emotions ; Employability ; Humanities and Social Sciences ; Impostor phenomenon ; Impostors ; Organizational citizenship behavior ; Shame ; Work environment</subject><ispartof>IDEAS Working Paper Series from RePEc, 2021-08, Vol.128, p.103601, Article 103601</ispartof><rights>2021 Elsevier Inc.</rights><rights>Copyright Elsevier Limited Aug 2021</rights><rights>2021. Notwithstanding the ProQuest Terms and conditions, you may use this content in accordance with the associated terms available at https://research.stlouisfed.org/research_terms.html .</rights><rights>Attribution - NonCommercial</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c430t-bcd47ca616abbecac537833826142cc33617b422ae2a71f3ddefc5a844b627ca3</citedby><cites>FETCH-LOGICAL-c430t-bcd47ca616abbecac537833826142cc33617b422ae2a71f3ddefc5a844b627ca3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0001879121000737$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>230,314,776,780,881,3537,27901,27902,65306</link.rule.ids><backlink>$$Uhttps://rennes-sb.hal.science/hal-03330558$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Hudson, Sarah</creatorcontrib><creatorcontrib>González-Gómez, Helena V.</creatorcontrib><title>Can impostors thrive at work? The impostor phenomenon's role in work and career outcomes</title><title>IDEAS Working Paper Series from RePEc</title><description>This paper examines the effect the impostor phenomenon (IP) on short-term emotions (shame) and performance (creativity and organizational citizenship behavior- OCB) at work, and on career outcomes. Previous research shows direct detrimental effects of IP on some short-term performance measures, but effects on creativity and OCB remain under-researched, and no work has investigated any career effects. Through an experimental approach (Studies 1 and 3) and an online vignette (Study 2) using working populations, we find that IP is expressed as shame in response to simulated and recalled real work events. Shame mediates the negative effect of IP on creativity, and its positive effect on OCB, and mechanistic organizational structure exacerbates the negative shame-creativity relationship. Furthermore, Study 4 uses a survey design to reveal that IP relates negatively to external employability and career success. Drawing on conservation of resources theory, we suggest that IP and shame deplete resources such that impostors suffer reduced ability to perform well at work in the short-term, with negative consequences for career success.
•Shame mediates the negative relationship between IP and creativity.•Impostors experiencing shame show increased OCB, to mitigate feelings of shame and the threatened self.•IP has a negative effect on external employability and career success.•IP and shame deplete personal resources leading to detrimental work effects and career outcomes.</description><subject>Business administration</subject><subject>Career development planning</subject><subject>Career success</subject><subject>Careers</subject><subject>Conservation of resources theory</subject><subject>Creativity</subject><subject>Emotions</subject><subject>Employability</subject><subject>Humanities and Social Sciences</subject><subject>Impostor phenomenon</subject><subject>Impostors</subject><subject>Organizational citizenship behavior</subject><subject>Shame</subject><subject>Work environment</subject><issn>0001-8791</issn><issn>1095-9084</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><sourceid>BENPR</sourceid><sourceid>PQCXX</sourceid><recordid>eNp9kU9LwzAYxoMoOKcfwFvAg3jozP9meJAx1AkDLxO8hTRNaevW1KSr-O1Nrey4Qwhvnt_z5uV9ALjGaIYRFvf1rO6zGUEEx5oKhE_ABKM5T-ZIslMwQQjhRKZzfA4uQqhjKbFMJ-BjqRtY7VoXOucD7Epf9RbqDn47__kIN6U9qLAtbeN28TS3AXq3jVLzx0Hd5NBob62Hbt-ZCIVLcFbobbBX__cUvD8_bZarZP328rpcrBPDKOqSzOQsNVpgobPMGm04TSWlkgjMiDGUCpxmjBBtiU5xQfPcFoZryVgmSDTSKbgb-5Z6q1pf7bT_UU5XarVYq-ENUUoR57LHkb0Z2da7r70Nnard3jdxPEW45JLNhWDHKU654AQNFB4p410I3haHzzFSQySqVjESNUSixkii52H02LiQvrJeBVPZxti88tZ0KnfVEfcvqqCSWQ</recordid><startdate>20210801</startdate><enddate>20210801</enddate><creator>Hudson, Sarah</creator><creator>González-Gómez, Helena V.</creator><general>Elsevier Inc</general><general>Elsevier Limited</general><general>Federal Reserve Bank of St. Louis</general><general>Elsevier</general><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7WY</scope><scope>7WZ</scope><scope>7XB</scope><scope>87Z</scope><scope>8FK</scope><scope>8FL</scope><scope>AAFGM</scope><scope>ABLUL</scope><scope>ABPUF</scope><scope>ABSSA</scope><scope>ABUWG</scope><scope>ACIOU</scope><scope>ADZZV</scope><scope>AFKRA</scope><scope>AGAJT</scope><scope>AGSBL</scope><scope>AJNOY</scope><scope>AQTIP</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BEZIV</scope><scope>BOUDT</scope><scope>CBHQV</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>FRNLG</scope><scope>F~G</scope><scope>K60</scope><scope>K6~</scope><scope>L.-</scope><scope>M0C</scope><scope>PIMPY</scope><scope>PQBIZ</scope><scope>PQBZA</scope><scope>PQCXX</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>Q9U</scope><scope>1XC</scope><scope>BXJBU</scope><scope>IHQJB</scope><scope>VOOES</scope></search><sort><creationdate>20210801</creationdate><title>Can impostors thrive at work? The impostor phenomenon's role in work and career outcomes</title><author>Hudson, Sarah ; González-Gómez, Helena V.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c430t-bcd47ca616abbecac537833826142cc33617b422ae2a71f3ddefc5a844b627ca3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Business administration</topic><topic>Career development planning</topic><topic>Career success</topic><topic>Careers</topic><topic>Conservation of resources theory</topic><topic>Creativity</topic><topic>Emotions</topic><topic>Employability</topic><topic>Humanities and Social Sciences</topic><topic>Impostor phenomenon</topic><topic>Impostors</topic><topic>Organizational citizenship behavior</topic><topic>Shame</topic><topic>Work environment</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hudson, Sarah</creatorcontrib><creatorcontrib>González-Gómez, Helena V.</creatorcontrib><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>ABI/INFORM Collection</collection><collection>ABI/INFORM Global (PDF only)</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>ABI/INFORM Global (Alumni Edition)</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>ABI/INFORM Collection (Alumni Edition)</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Business Premium Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central Korea</collection><collection>Business Premium Collection (Alumni)</collection><collection>ABI/INFORM Global (Corporate)</collection><collection>ProQuest Business Collection (Alumni Edition)</collection><collection>ProQuest Business Collection</collection><collection>ABI/INFORM Professional Advanced</collection><collection>ABI/INFORM Global</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Business</collection><collection>ProQuest One Business (Alumni)</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central Basic</collection><collection>Hyper Article en Ligne (HAL)</collection><collection>HAL-SHS: Archive ouverte en Sciences de l'Homme et de la Société</collection><collection>HAL-SHS: Archive ouverte en Sciences de l'Homme et de la Société (Open Access)</collection><collection>Hyper Article en Ligne (HAL) (Open Access)</collection><jtitle>IDEAS Working Paper Series from RePEc</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hudson, Sarah</au><au>González-Gómez, Helena V.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Can impostors thrive at work? The impostor phenomenon's role in work and career outcomes</atitle><jtitle>IDEAS Working Paper Series from RePEc</jtitle><date>2021-08-01</date><risdate>2021</risdate><volume>128</volume><spage>103601</spage><pages>103601-</pages><artnum>103601</artnum><issn>0001-8791</issn><eissn>1095-9084</eissn><abstract>This paper examines the effect the impostor phenomenon (IP) on short-term emotions (shame) and performance (creativity and organizational citizenship behavior- OCB) at work, and on career outcomes. Previous research shows direct detrimental effects of IP on some short-term performance measures, but effects on creativity and OCB remain under-researched, and no work has investigated any career effects. Through an experimental approach (Studies 1 and 3) and an online vignette (Study 2) using working populations, we find that IP is expressed as shame in response to simulated and recalled real work events. Shame mediates the negative effect of IP on creativity, and its positive effect on OCB, and mechanistic organizational structure exacerbates the negative shame-creativity relationship. Furthermore, Study 4 uses a survey design to reveal that IP relates negatively to external employability and career success. Drawing on conservation of resources theory, we suggest that IP and shame deplete resources such that impostors suffer reduced ability to perform well at work in the short-term, with negative consequences for career success.
•Shame mediates the negative relationship between IP and creativity.•Impostors experiencing shame show increased OCB, to mitigate feelings of shame and the threatened self.•IP has a negative effect on external employability and career success.•IP and shame deplete personal resources leading to detrimental work effects and career outcomes.</abstract><cop>Philadelphia</cop><pub>Elsevier Inc</pub><doi>10.1016/j.jvb.2021.103601</doi><oa>free_for_read</oa></addata></record> |
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subjects | Business administration Career development planning Career success Careers Conservation of resources theory Creativity Emotions Employability Humanities and Social Sciences Impostor phenomenon Impostors Organizational citizenship behavior Shame Work environment |
title | Can impostors thrive at work? The impostor phenomenon's role in work and career outcomes |
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