An In Situ and Real Time Plasmonic Approach of Seed/Adhesion Layers: Chromium Buer Eect at the Zinc/Alumina Interface

The effect of additives on metal/oxide interfaces is explored in situ and in real time on evaporated films by a combination of surface science techniques, among which a very flexible optical method shows a unique ability to scrutinize the growth and wetting properties of supported clusters that invo...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Crystal growth & design 2021-06, Vol.21 (6), p.3528-3539
Hauptverfasser: Messaykeh, Maya, Chenot, Stéphane, David, Pascal, Cabailh, Gregory, Jupille, Jacques, Koltsov, Alexey, Lazzari, Remi
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 3539
container_issue 6
container_start_page 3528
container_title Crystal growth & design
container_volume 21
creator Messaykeh, Maya
Chenot, Stéphane
David, Pascal
Cabailh, Gregory
Jupille, Jacques
Koltsov, Alexey
Lazzari, Remi
description The effect of additives on metal/oxide interfaces is explored in situ and in real time on evaporated films by a combination of surface science techniques, among which a very flexible optical method shows a unique ability to scrutinize the growth and wetting properties of supported clusters that involve several elements. The study focuses on Cr at the Zn/α-Al2O3(0001) interface at 300 K. A particular interest of the present interface is that Zn does not stick at all on bare alumina. The sticking and morphology of both Cr and Zn films during their growth are analyzed from sub-monolayer to multilayer thicknesses. After an initial oxidation reaction with residual OH groups, shown to be detrimental to Zn adhesion, Cr growth proceeds through the formation of high aspect ratio particles that percolate around an average thickness of 10 Å. With regard to Zn growth on a Cr deposit, two very distinct stages can be distinguished. In the sub-monolayer thickness range, Cr forms a seed layer that drastically increases the Zn sticking coefficient from 0 to nearly 1 due to a diffusion length of physisorbed Zn adatoms before desorption larger than Cr island separation; Zn clusters are anchored on the Cr seeds that they encapsulate, but their wetting behavior is dictated by the interaction with alumina. In a second stage, as soon as the Cr film percolates, it forms an adhesion layer on which Zn grows in a nearly two-dimensional mode. In all cases, Cr films are stable upon annealing. On Cr-covered alumina, the Zn desorption energy is enhanced as compared to bare surfaces, which, in line with atomistic simulations, is assigned to the formation of more favorable Cr–Al2O3 and Cr–Zn than Zn–Al2O3 bonds. Generally speaking, the ability demonstrated herein of small amounts of additives to dramatically increase the adhesion of films is of great practical interest. It shows that noncontinuous and partially oxidized films of additives, closer to realistic cases of application, can strongly enhance the sticking of films. Also, anchoring a functional film by discrete predeposited seeds can keep its properties intact.
doi_str_mv 10.1021/acs.cgd.1c00299
format Article
fullrecord <record><control><sourceid>hal</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_03274561v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>oai_HAL_hal_03274561v1</sourcerecordid><originalsourceid>FETCH-hal_primary_oai_HAL_hal_03274561v13</originalsourceid><addsrcrecordid>eNqVjUtLw0AURgdRsD7Wbu_WRZOZTNO07mKpVOhCbFduwmVyY0bmEeYh9N-roD_A1Xc4HPgYuxO8ELwSJapYqPe-EIrzar0-YzNRV6t5U_P6_I8XK3nJrmL84Jw3SylnLLcOnh0cdMqArodXQgNHbQleDEbrnVbQTlPwqEbwAxyI-rLtR4raO9jjiUJ8gM0YvNXZwmOmAFtSCTBBGgnetFNla7LVDr-PEoUBFd2wiwFNpNvfvWb3T9vjZjcf0XRT0BbDqfOou127734cl1WzqJfiU8j_tF84AlV7</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>An In Situ and Real Time Plasmonic Approach of Seed/Adhesion Layers: Chromium Buer Eect at the Zinc/Alumina Interface</title><source>American Chemical Society Journals</source><creator>Messaykeh, Maya ; Chenot, Stéphane ; David, Pascal ; Cabailh, Gregory ; Jupille, Jacques ; Koltsov, Alexey ; Lazzari, Remi</creator><creatorcontrib>Messaykeh, Maya ; Chenot, Stéphane ; David, Pascal ; Cabailh, Gregory ; Jupille, Jacques ; Koltsov, Alexey ; Lazzari, Remi</creatorcontrib><description>The effect of additives on metal/oxide interfaces is explored in situ and in real time on evaporated films by a combination of surface science techniques, among which a very flexible optical method shows a unique ability to scrutinize the growth and wetting properties of supported clusters that involve several elements. The study focuses on Cr at the Zn/α-Al2O3(0001) interface at 300 K. A particular interest of the present interface is that Zn does not stick at all on bare alumina. The sticking and morphology of both Cr and Zn films during their growth are analyzed from sub-monolayer to multilayer thicknesses. After an initial oxidation reaction with residual OH groups, shown to be detrimental to Zn adhesion, Cr growth proceeds through the formation of high aspect ratio particles that percolate around an average thickness of 10 Å. With regard to Zn growth on a Cr deposit, two very distinct stages can be distinguished. In the sub-monolayer thickness range, Cr forms a seed layer that drastically increases the Zn sticking coefficient from 0 to nearly 1 due to a diffusion length of physisorbed Zn adatoms before desorption larger than Cr island separation; Zn clusters are anchored on the Cr seeds that they encapsulate, but their wetting behavior is dictated by the interaction with alumina. In a second stage, as soon as the Cr film percolates, it forms an adhesion layer on which Zn grows in a nearly two-dimensional mode. In all cases, Cr films are stable upon annealing. On Cr-covered alumina, the Zn desorption energy is enhanced as compared to bare surfaces, which, in line with atomistic simulations, is assigned to the formation of more favorable Cr–Al2O3 and Cr–Zn than Zn–Al2O3 bonds. Generally speaking, the ability demonstrated herein of small amounts of additives to dramatically increase the adhesion of films is of great practical interest. It shows that noncontinuous and partially oxidized films of additives, closer to realistic cases of application, can strongly enhance the sticking of films. Also, anchoring a functional film by discrete predeposited seeds can keep its properties intact.</description><identifier>ISSN: 1528-7483</identifier><identifier>EISSN: 1528-7505</identifier><identifier>DOI: 10.1021/acs.cgd.1c00299</identifier><language>eng</language><publisher>American Chemical Society</publisher><subject>Life Sciences</subject><ispartof>Crystal growth &amp; design, 2021-06, Vol.21 (6), p.3528-3539</ispartof><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0003-2354-1953 ; 0000-0003-2354-1953</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27923,27924</link.rule.ids><backlink>$$Uhttps://hal.sorbonne-universite.fr/hal-03274561$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Messaykeh, Maya</creatorcontrib><creatorcontrib>Chenot, Stéphane</creatorcontrib><creatorcontrib>David, Pascal</creatorcontrib><creatorcontrib>Cabailh, Gregory</creatorcontrib><creatorcontrib>Jupille, Jacques</creatorcontrib><creatorcontrib>Koltsov, Alexey</creatorcontrib><creatorcontrib>Lazzari, Remi</creatorcontrib><title>An In Situ and Real Time Plasmonic Approach of Seed/Adhesion Layers: Chromium Buer Eect at the Zinc/Alumina Interface</title><title>Crystal growth &amp; design</title><description>The effect of additives on metal/oxide interfaces is explored in situ and in real time on evaporated films by a combination of surface science techniques, among which a very flexible optical method shows a unique ability to scrutinize the growth and wetting properties of supported clusters that involve several elements. The study focuses on Cr at the Zn/α-Al2O3(0001) interface at 300 K. A particular interest of the present interface is that Zn does not stick at all on bare alumina. The sticking and morphology of both Cr and Zn films during their growth are analyzed from sub-monolayer to multilayer thicknesses. After an initial oxidation reaction with residual OH groups, shown to be detrimental to Zn adhesion, Cr growth proceeds through the formation of high aspect ratio particles that percolate around an average thickness of 10 Å. With regard to Zn growth on a Cr deposit, two very distinct stages can be distinguished. In the sub-monolayer thickness range, Cr forms a seed layer that drastically increases the Zn sticking coefficient from 0 to nearly 1 due to a diffusion length of physisorbed Zn adatoms before desorption larger than Cr island separation; Zn clusters are anchored on the Cr seeds that they encapsulate, but their wetting behavior is dictated by the interaction with alumina. In a second stage, as soon as the Cr film percolates, it forms an adhesion layer on which Zn grows in a nearly two-dimensional mode. In all cases, Cr films are stable upon annealing. On Cr-covered alumina, the Zn desorption energy is enhanced as compared to bare surfaces, which, in line with atomistic simulations, is assigned to the formation of more favorable Cr–Al2O3 and Cr–Zn than Zn–Al2O3 bonds. Generally speaking, the ability demonstrated herein of small amounts of additives to dramatically increase the adhesion of films is of great practical interest. It shows that noncontinuous and partially oxidized films of additives, closer to realistic cases of application, can strongly enhance the sticking of films. Also, anchoring a functional film by discrete predeposited seeds can keep its properties intact.</description><subject>Life Sciences</subject><issn>1528-7483</issn><issn>1528-7505</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNqVjUtLw0AURgdRsD7Wbu_WRZOZTNO07mKpVOhCbFduwmVyY0bmEeYh9N-roD_A1Xc4HPgYuxO8ELwSJapYqPe-EIrzar0-YzNRV6t5U_P6_I8XK3nJrmL84Jw3SylnLLcOnh0cdMqArodXQgNHbQleDEbrnVbQTlPwqEbwAxyI-rLtR4raO9jjiUJ8gM0YvNXZwmOmAFtSCTBBGgnetFNla7LVDr-PEoUBFd2wiwFNpNvfvWb3T9vjZjcf0XRT0BbDqfOou127734cl1WzqJfiU8j_tF84AlV7</recordid><startdate>20210602</startdate><enddate>20210602</enddate><creator>Messaykeh, Maya</creator><creator>Chenot, Stéphane</creator><creator>David, Pascal</creator><creator>Cabailh, Gregory</creator><creator>Jupille, Jacques</creator><creator>Koltsov, Alexey</creator><creator>Lazzari, Remi</creator><general>American Chemical Society</general><scope>1XC</scope><scope>VOOES</scope><orcidid>https://orcid.org/0000-0003-2354-1953</orcidid><orcidid>https://orcid.org/0000-0003-2354-1953</orcidid></search><sort><creationdate>20210602</creationdate><title>An In Situ and Real Time Plasmonic Approach of Seed/Adhesion Layers: Chromium Buer Eect at the Zinc/Alumina Interface</title><author>Messaykeh, Maya ; Chenot, Stéphane ; David, Pascal ; Cabailh, Gregory ; Jupille, Jacques ; Koltsov, Alexey ; Lazzari, Remi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-hal_primary_oai_HAL_hal_03274561v13</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Life Sciences</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Messaykeh, Maya</creatorcontrib><creatorcontrib>Chenot, Stéphane</creatorcontrib><creatorcontrib>David, Pascal</creatorcontrib><creatorcontrib>Cabailh, Gregory</creatorcontrib><creatorcontrib>Jupille, Jacques</creatorcontrib><creatorcontrib>Koltsov, Alexey</creatorcontrib><creatorcontrib>Lazzari, Remi</creatorcontrib><collection>Hyper Article en Ligne (HAL)</collection><collection>Hyper Article en Ligne (HAL) (Open Access)</collection><jtitle>Crystal growth &amp; design</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Messaykeh, Maya</au><au>Chenot, Stéphane</au><au>David, Pascal</au><au>Cabailh, Gregory</au><au>Jupille, Jacques</au><au>Koltsov, Alexey</au><au>Lazzari, Remi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>An In Situ and Real Time Plasmonic Approach of Seed/Adhesion Layers: Chromium Buer Eect at the Zinc/Alumina Interface</atitle><jtitle>Crystal growth &amp; design</jtitle><date>2021-06-02</date><risdate>2021</risdate><volume>21</volume><issue>6</issue><spage>3528</spage><epage>3539</epage><pages>3528-3539</pages><issn>1528-7483</issn><eissn>1528-7505</eissn><abstract>The effect of additives on metal/oxide interfaces is explored in situ and in real time on evaporated films by a combination of surface science techniques, among which a very flexible optical method shows a unique ability to scrutinize the growth and wetting properties of supported clusters that involve several elements. The study focuses on Cr at the Zn/α-Al2O3(0001) interface at 300 K. A particular interest of the present interface is that Zn does not stick at all on bare alumina. The sticking and morphology of both Cr and Zn films during their growth are analyzed from sub-monolayer to multilayer thicknesses. After an initial oxidation reaction with residual OH groups, shown to be detrimental to Zn adhesion, Cr growth proceeds through the formation of high aspect ratio particles that percolate around an average thickness of 10 Å. With regard to Zn growth on a Cr deposit, two very distinct stages can be distinguished. In the sub-monolayer thickness range, Cr forms a seed layer that drastically increases the Zn sticking coefficient from 0 to nearly 1 due to a diffusion length of physisorbed Zn adatoms before desorption larger than Cr island separation; Zn clusters are anchored on the Cr seeds that they encapsulate, but their wetting behavior is dictated by the interaction with alumina. In a second stage, as soon as the Cr film percolates, it forms an adhesion layer on which Zn grows in a nearly two-dimensional mode. In all cases, Cr films are stable upon annealing. On Cr-covered alumina, the Zn desorption energy is enhanced as compared to bare surfaces, which, in line with atomistic simulations, is assigned to the formation of more favorable Cr–Al2O3 and Cr–Zn than Zn–Al2O3 bonds. Generally speaking, the ability demonstrated herein of small amounts of additives to dramatically increase the adhesion of films is of great practical interest. It shows that noncontinuous and partially oxidized films of additives, closer to realistic cases of application, can strongly enhance the sticking of films. Also, anchoring a functional film by discrete predeposited seeds can keep its properties intact.</abstract><pub>American Chemical Society</pub><doi>10.1021/acs.cgd.1c00299</doi><orcidid>https://orcid.org/0000-0003-2354-1953</orcidid><orcidid>https://orcid.org/0000-0003-2354-1953</orcidid><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 1528-7483
ispartof Crystal growth & design, 2021-06, Vol.21 (6), p.3528-3539
issn 1528-7483
1528-7505
language eng
recordid cdi_hal_primary_oai_HAL_hal_03274561v1
source American Chemical Society Journals
subjects Life Sciences
title An In Situ and Real Time Plasmonic Approach of Seed/Adhesion Layers: Chromium Buer Eect at the Zinc/Alumina Interface
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T21%3A03%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-hal&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=An%20In%20Situ%20and%20Real%20Time%20Plasmonic%20Approach%20of%20Seed/Adhesion%20Layers:%20Chromium%20Buer%20Eect%20at%20the%20Zinc/Alumina%20Interface&rft.jtitle=Crystal%20growth%20&%20design&rft.au=Messaykeh,%20Maya&rft.date=2021-06-02&rft.volume=21&rft.issue=6&rft.spage=3528&rft.epage=3539&rft.pages=3528-3539&rft.issn=1528-7483&rft.eissn=1528-7505&rft_id=info:doi/10.1021/acs.cgd.1c00299&rft_dat=%3Chal%3Eoai_HAL_hal_03274561v1%3C/hal%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true