Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High‑χ Block Copolymers

The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful method for the manufacture of high-resolution features. Critical issues remain to be addressed for successful implementation of DSA, such as dewetting and controlled orientation of BCP domains through physicochemical manipulat...

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Veröffentlicht in:ACS applied materials & interfaces 2021-03, Vol.13 (9), p.11224-11236
Hauptverfasser: Chevalier, Xavier, Gomes Correia, Cindy, Pound-Lana, Gwenaelle, Bézard, Philippe, Sérégé, Matthieu, Petit-Etienne, Camille, Gay, Guillaume, Cunge, Gilles, Cabannes-Boué, Benjamin, Nicolet, Célia, Navarro, Christophe, Cayrefourcq, Ian, Müller, Marcus, Hadziioannou, Georges, Iliopoulos, Ilias, Fleury, Guillaume, Zelsmann, Marc
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container_end_page 11236
container_issue 9
container_start_page 11224
container_title ACS applied materials & interfaces
container_volume 13
creator Chevalier, Xavier
Gomes Correia, Cindy
Pound-Lana, Gwenaelle
Bézard, Philippe
Sérégé, Matthieu
Petit-Etienne, Camille
Gay, Guillaume
Cunge, Gilles
Cabannes-Boué, Benjamin
Nicolet, Célia
Navarro, Christophe
Cayrefourcq, Ian
Müller, Marcus
Hadziioannou, Georges
Iliopoulos, Ilias
Fleury, Guillaume
Zelsmann, Marc
description The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful method for the manufacture of high-resolution features. Critical issues remain to be addressed for successful implementation of DSA, such as dewetting and controlled orientation of BCP domains through physicochemical manipulations at the BCP interfaces, and the spatial positioning and registration of the BCP features. Here, we introduce novel top-coat (TC) materials designed to undergo cross-linking reactions triggered by thermal or photoactivation processes. The cross-linked TC layer with adjusted composition induces a mechanical confinement of the BCP layer, suppressing its dewetting while promoting perpendicular orientation of BCP domains. The selection of areas of interest with perpendicular features is performed directly on the patternable TC layer via a lithography step and leverages attractive integration pathways for the generation of locally controlled BCP patterns and nanostructured BCP multilayers.
doi_str_mv 10.1021/acsami.1c00694
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fullrecord <record><control><sourceid>proquest_hal_p</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_03218670v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2493005425</sourcerecordid><originalsourceid>FETCH-LOGICAL-a404t-f64ada173c62e7e7e77cbb2cb370250c75c77ca719deebbb3c04a4165a8b18a53</originalsourceid><addsrcrecordid>eNp1kbtu2zAUhomiRZOmWTsWHNsAcnmTZI-Jc3EAoV2SmTikKZsJJaqk1MBbt859srxDniQU5HorOBzi4Pu_4T8IfaJkRgmj30BHaOyMakKKhXiDjulCiGzOcvb28BfiCH2I8SEhnJH8PTrivGBUFPwYbSrbb_0mQLe1Gpzb4UtT29as8TL4GLPKto-gnMF3vsNLD33EtQ_4O7S-gXaoQfdDsO0GPyUPXtnN9uX33-c_-MJ5_ZgCnXe7xoT4Eb2rwUVzup8n6P766m65yqofN7fL8yoDQUSf1YWANdCS64KZcnylVoppxUvCcqLLXKcNlHSxNkYpxTURIGiRw1zROeT8BH2dvFtwsgu2gbCTHqxcnVdy3BHO6LwoyS-a2C8T2wX_czCxl42N2jgHrfFDlEwsOCG5YKN2NqF6bCWY-uCmRI6HkNMh5P4QKfB57x5UY9YH_F_zCTibgBSUD34Ibarlf7ZX1dOU2Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2493005425</pqid></control><display><type>article</type><title>Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High‑χ Block Copolymers</title><source>ACS Publications</source><creator>Chevalier, Xavier ; Gomes Correia, Cindy ; Pound-Lana, Gwenaelle ; Bézard, Philippe ; Sérégé, Matthieu ; Petit-Etienne, Camille ; Gay, Guillaume ; Cunge, Gilles ; Cabannes-Boué, Benjamin ; Nicolet, Célia ; Navarro, Christophe ; Cayrefourcq, Ian ; Müller, Marcus ; Hadziioannou, Georges ; Iliopoulos, Ilias ; Fleury, Guillaume ; Zelsmann, Marc</creator><creatorcontrib>Chevalier, Xavier ; Gomes Correia, Cindy ; Pound-Lana, Gwenaelle ; Bézard, Philippe ; Sérégé, Matthieu ; Petit-Etienne, Camille ; Gay, Guillaume ; Cunge, Gilles ; Cabannes-Boué, Benjamin ; Nicolet, Célia ; Navarro, Christophe ; Cayrefourcq, Ian ; Müller, Marcus ; Hadziioannou, Georges ; Iliopoulos, Ilias ; Fleury, Guillaume ; Zelsmann, Marc</creatorcontrib><description>The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful method for the manufacture of high-resolution features. Critical issues remain to be addressed for successful implementation of DSA, such as dewetting and controlled orientation of BCP domains through physicochemical manipulations at the BCP interfaces, and the spatial positioning and registration of the BCP features. Here, we introduce novel top-coat (TC) materials designed to undergo cross-linking reactions triggered by thermal or photoactivation processes. The cross-linked TC layer with adjusted composition induces a mechanical confinement of the BCP layer, suppressing its dewetting while promoting perpendicular orientation of BCP domains. The selection of areas of interest with perpendicular features is performed directly on the patternable TC layer via a lithography step and leverages attractive integration pathways for the generation of locally controlled BCP patterns and nanostructured BCP multilayers.</description><identifier>ISSN: 1944-8244</identifier><identifier>EISSN: 1944-8252</identifier><identifier>DOI: 10.1021/acsami.1c00694</identifier><identifier>PMID: 33621463</identifier><language>eng</language><publisher>United States: American Chemical Society</publisher><subject>Chemical Sciences ; Condensed Matter ; Engineering Sciences ; Functional Nanostructured Materials (including low-D carbon) ; Materials ; Physics ; Polymers ; Soft Condensed Matter</subject><ispartof>ACS applied materials &amp; interfaces, 2021-03, Vol.13 (9), p.11224-11236</ispartof><rights>2021 American Chemical Society</rights><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-a404t-f64ada173c62e7e7e77cbb2cb370250c75c77ca719deebbb3c04a4165a8b18a53</citedby><cites>FETCH-LOGICAL-a404t-f64ada173c62e7e7e77cbb2cb370250c75c77ca719deebbb3c04a4165a8b18a53</cites><orcidid>0000-0002-7472-973X ; 0000-0001-7397-7849 ; 0000-0003-4199-5529 ; 0000-0002-7619-4871 ; 0000-0002-7377-6040 ; 0000-0003-0779-191X</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://pubs.acs.org/doi/pdf/10.1021/acsami.1c00694$$EPDF$$P50$$Gacs$$H</linktopdf><linktohtml>$$Uhttps://pubs.acs.org/doi/10.1021/acsami.1c00694$$EHTML$$P50$$Gacs$$H</linktohtml><link.rule.ids>230,314,778,782,883,2754,27063,27911,27912,56725,56775</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/33621463$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink><backlink>$$Uhttps://hal.science/hal-03218670$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Chevalier, Xavier</creatorcontrib><creatorcontrib>Gomes Correia, Cindy</creatorcontrib><creatorcontrib>Pound-Lana, Gwenaelle</creatorcontrib><creatorcontrib>Bézard, Philippe</creatorcontrib><creatorcontrib>Sérégé, Matthieu</creatorcontrib><creatorcontrib>Petit-Etienne, Camille</creatorcontrib><creatorcontrib>Gay, Guillaume</creatorcontrib><creatorcontrib>Cunge, Gilles</creatorcontrib><creatorcontrib>Cabannes-Boué, Benjamin</creatorcontrib><creatorcontrib>Nicolet, Célia</creatorcontrib><creatorcontrib>Navarro, Christophe</creatorcontrib><creatorcontrib>Cayrefourcq, Ian</creatorcontrib><creatorcontrib>Müller, Marcus</creatorcontrib><creatorcontrib>Hadziioannou, Georges</creatorcontrib><creatorcontrib>Iliopoulos, Ilias</creatorcontrib><creatorcontrib>Fleury, Guillaume</creatorcontrib><creatorcontrib>Zelsmann, Marc</creatorcontrib><title>Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High‑χ Block Copolymers</title><title>ACS applied materials &amp; interfaces</title><addtitle>ACS Appl. Mater. Interfaces</addtitle><description>The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful method for the manufacture of high-resolution features. Critical issues remain to be addressed for successful implementation of DSA, such as dewetting and controlled orientation of BCP domains through physicochemical manipulations at the BCP interfaces, and the spatial positioning and registration of the BCP features. Here, we introduce novel top-coat (TC) materials designed to undergo cross-linking reactions triggered by thermal or photoactivation processes. The cross-linked TC layer with adjusted composition induces a mechanical confinement of the BCP layer, suppressing its dewetting while promoting perpendicular orientation of BCP domains. The selection of areas of interest with perpendicular features is performed directly on the patternable TC layer via a lithography step and leverages attractive integration pathways for the generation of locally controlled BCP patterns and nanostructured BCP multilayers.</description><subject>Chemical Sciences</subject><subject>Condensed Matter</subject><subject>Engineering Sciences</subject><subject>Functional Nanostructured Materials (including low-D carbon)</subject><subject>Materials</subject><subject>Physics</subject><subject>Polymers</subject><subject>Soft Condensed Matter</subject><issn>1944-8244</issn><issn>1944-8252</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNp1kbtu2zAUhomiRZOmWTsWHNsAcnmTZI-Jc3EAoV2SmTikKZsJJaqk1MBbt859srxDniQU5HorOBzi4Pu_4T8IfaJkRgmj30BHaOyMakKKhXiDjulCiGzOcvb28BfiCH2I8SEhnJH8PTrivGBUFPwYbSrbb_0mQLe1Gpzb4UtT29as8TL4GLPKto-gnMF3vsNLD33EtQ_4O7S-gXaoQfdDsO0GPyUPXtnN9uX33-c_-MJ5_ZgCnXe7xoT4Eb2rwUVzup8n6P766m65yqofN7fL8yoDQUSf1YWANdCS64KZcnylVoppxUvCcqLLXKcNlHSxNkYpxTURIGiRw1zROeT8BH2dvFtwsgu2gbCTHqxcnVdy3BHO6LwoyS-a2C8T2wX_czCxl42N2jgHrfFDlEwsOCG5YKN2NqF6bCWY-uCmRI6HkNMh5P4QKfB57x5UY9YH_F_zCTibgBSUD34Ibarlf7ZX1dOU2Q</recordid><startdate>20210310</startdate><enddate>20210310</enddate><creator>Chevalier, Xavier</creator><creator>Gomes Correia, Cindy</creator><creator>Pound-Lana, Gwenaelle</creator><creator>Bézard, Philippe</creator><creator>Sérégé, Matthieu</creator><creator>Petit-Etienne, Camille</creator><creator>Gay, Guillaume</creator><creator>Cunge, Gilles</creator><creator>Cabannes-Boué, Benjamin</creator><creator>Nicolet, Célia</creator><creator>Navarro, Christophe</creator><creator>Cayrefourcq, Ian</creator><creator>Müller, Marcus</creator><creator>Hadziioannou, Georges</creator><creator>Iliopoulos, Ilias</creator><creator>Fleury, Guillaume</creator><creator>Zelsmann, Marc</creator><general>American Chemical Society</general><general>Washington, D.C. : American Chemical Society</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>1XC</scope><scope>VOOES</scope><orcidid>https://orcid.org/0000-0002-7472-973X</orcidid><orcidid>https://orcid.org/0000-0001-7397-7849</orcidid><orcidid>https://orcid.org/0000-0003-4199-5529</orcidid><orcidid>https://orcid.org/0000-0002-7619-4871</orcidid><orcidid>https://orcid.org/0000-0002-7377-6040</orcidid><orcidid>https://orcid.org/0000-0003-0779-191X</orcidid></search><sort><creationdate>20210310</creationdate><title>Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High‑χ Block Copolymers</title><author>Chevalier, Xavier ; Gomes Correia, Cindy ; Pound-Lana, Gwenaelle ; Bézard, Philippe ; Sérégé, Matthieu ; Petit-Etienne, Camille ; Gay, Guillaume ; Cunge, Gilles ; Cabannes-Boué, Benjamin ; Nicolet, Célia ; Navarro, Christophe ; Cayrefourcq, Ian ; Müller, Marcus ; Hadziioannou, Georges ; Iliopoulos, Ilias ; Fleury, Guillaume ; Zelsmann, Marc</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-a404t-f64ada173c62e7e7e77cbb2cb370250c75c77ca719deebbb3c04a4165a8b18a53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Chemical Sciences</topic><topic>Condensed Matter</topic><topic>Engineering Sciences</topic><topic>Functional Nanostructured Materials (including low-D carbon)</topic><topic>Materials</topic><topic>Physics</topic><topic>Polymers</topic><topic>Soft Condensed Matter</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chevalier, Xavier</creatorcontrib><creatorcontrib>Gomes Correia, Cindy</creatorcontrib><creatorcontrib>Pound-Lana, Gwenaelle</creatorcontrib><creatorcontrib>Bézard, Philippe</creatorcontrib><creatorcontrib>Sérégé, Matthieu</creatorcontrib><creatorcontrib>Petit-Etienne, Camille</creatorcontrib><creatorcontrib>Gay, Guillaume</creatorcontrib><creatorcontrib>Cunge, Gilles</creatorcontrib><creatorcontrib>Cabannes-Boué, Benjamin</creatorcontrib><creatorcontrib>Nicolet, Célia</creatorcontrib><creatorcontrib>Navarro, Christophe</creatorcontrib><creatorcontrib>Cayrefourcq, Ian</creatorcontrib><creatorcontrib>Müller, Marcus</creatorcontrib><creatorcontrib>Hadziioannou, Georges</creatorcontrib><creatorcontrib>Iliopoulos, Ilias</creatorcontrib><creatorcontrib>Fleury, Guillaume</creatorcontrib><creatorcontrib>Zelsmann, Marc</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Hyper Article en Ligne (HAL)</collection><collection>Hyper Article en Ligne (HAL) (Open Access)</collection><jtitle>ACS applied materials &amp; interfaces</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chevalier, Xavier</au><au>Gomes Correia, Cindy</au><au>Pound-Lana, Gwenaelle</au><au>Bézard, Philippe</au><au>Sérégé, Matthieu</au><au>Petit-Etienne, Camille</au><au>Gay, Guillaume</au><au>Cunge, Gilles</au><au>Cabannes-Boué, Benjamin</au><au>Nicolet, Célia</au><au>Navarro, Christophe</au><au>Cayrefourcq, Ian</au><au>Müller, Marcus</au><au>Hadziioannou, Georges</au><au>Iliopoulos, Ilias</au><au>Fleury, Guillaume</au><au>Zelsmann, Marc</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High‑χ Block Copolymers</atitle><jtitle>ACS applied materials &amp; interfaces</jtitle><addtitle>ACS Appl. Mater. Interfaces</addtitle><date>2021-03-10</date><risdate>2021</risdate><volume>13</volume><issue>9</issue><spage>11224</spage><epage>11236</epage><pages>11224-11236</pages><issn>1944-8244</issn><eissn>1944-8252</eissn><abstract>The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful method for the manufacture of high-resolution features. Critical issues remain to be addressed for successful implementation of DSA, such as dewetting and controlled orientation of BCP domains through physicochemical manipulations at the BCP interfaces, and the spatial positioning and registration of the BCP features. Here, we introduce novel top-coat (TC) materials designed to undergo cross-linking reactions triggered by thermal or photoactivation processes. The cross-linked TC layer with adjusted composition induces a mechanical confinement of the BCP layer, suppressing its dewetting while promoting perpendicular orientation of BCP domains. The selection of areas of interest with perpendicular features is performed directly on the patternable TC layer via a lithography step and leverages attractive integration pathways for the generation of locally controlled BCP patterns and nanostructured BCP multilayers.</abstract><cop>United States</cop><pub>American Chemical Society</pub><pmid>33621463</pmid><doi>10.1021/acsami.1c00694</doi><tpages>13</tpages><orcidid>https://orcid.org/0000-0002-7472-973X</orcidid><orcidid>https://orcid.org/0000-0001-7397-7849</orcidid><orcidid>https://orcid.org/0000-0003-4199-5529</orcidid><orcidid>https://orcid.org/0000-0002-7619-4871</orcidid><orcidid>https://orcid.org/0000-0002-7377-6040</orcidid><orcidid>https://orcid.org/0000-0003-0779-191X</orcidid><oa>free_for_read</oa></addata></record>
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issn 1944-8244
1944-8252
language eng
recordid cdi_hal_primary_oai_HAL_hal_03218670v1
source ACS Publications
subjects Chemical Sciences
Condensed Matter
Engineering Sciences
Functional Nanostructured Materials (including low-D carbon)
Materials
Physics
Polymers
Soft Condensed Matter
title Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High‑χ Block Copolymers
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T14%3A18%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_hal_p&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Lithographically%20Defined%20Cross-Linkable%20Top%20Coats%20for%20Nanomanufacturing%20with%20High%E2%80%91%CF%87%20Block%20Copolymers&rft.jtitle=ACS%20applied%20materials%20&%20interfaces&rft.au=Chevalier,%20Xavier&rft.date=2021-03-10&rft.volume=13&rft.issue=9&rft.spage=11224&rft.epage=11236&rft.pages=11224-11236&rft.issn=1944-8244&rft.eissn=1944-8252&rft_id=info:doi/10.1021/acsami.1c00694&rft_dat=%3Cproquest_hal_p%3E2493005425%3C/proquest_hal_p%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2493005425&rft_id=info:pmid/33621463&rfr_iscdi=true