Growth and characterization of nickel oxide ultra-thin films

The oxidation of the Ni(111) surface under ultrahigh-vacuum conditions is studied experimentally with low-energy electron diffraction and high-resolution X-ray photoelectron spectroscopy. Exposure of the clean Ni(111) surface to molecular oxygen at room temperature followed by annealing at 400 K lea...

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Veröffentlicht in:	Surfaces and interfaces 2020-03, Vol.18, p.100433, Article 100433
Hauptverfasser:	El Boujlaidi, Abdelaziz, Rochdi, Nabil, Tchalala, Rachid, Enriquez, Hanna, Mayne, Andrew J., Oughaddou, Hamid
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed Matter High-resolution X-ray photoelectron spectroscopy Low-energy electron diffraction Materials Science Nickel oxide NiO monolayer Oxygen coverage Physics
Online-Zugang:	Volltext
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