Single-step electrodeposition of superhydrophobic black NiO thin films
Black finished surfaces have extensive applications in many domains, such as optics, solar cells, and aerospace. The single-step electrodeposition of superhydrophobic black NiO films from a dimethyl sulfoxide-based electrolyte is described in this paper. The physicochemical properties of the obtaine...
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| Veröffentlicht in: | Journal of applied electrochemistry 2019-06, Vol.49 (6), p.621-629 |
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| container_title | Journal of applied electrochemistry |
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| creator | Bahramian, A. Eyraud, M. Vacandio, F. Hornebecq, V. Djenizian, T. Knauth, P. |
| description | Black finished surfaces have extensive applications in many domains, such as optics, solar cells, and aerospace. The single-step electrodeposition of superhydrophobic black NiO films from a dimethyl sulfoxide-based electrolyte is described in this paper. The physicochemical properties of the obtained film were characterized using scanning electron microscopy, X-ray diffraction, and electrochemical tests (electrochemical impedance spectroscopy and potentiodynamic polarization). A rough surface with a low reflection of light was formed after the deposition process that increased the contact angle of water from about 87° (for bare Cu) to 163° (in presence of the black coating), which improved the corrosion resistance of the Cu substrate by about 30%. The formed black NiO film revealed a notably high stability and kept its appearance even after corrosion tests.
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| doi_str_mv | 10.1007/s10800-019-01305-2 |
| format | Article |
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Graphical Abstract</description><subject>Chemical Sciences</subject><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Contact angle</subject><subject>Copper</subject><subject>Corrosion resistance</subject><subject>Corrosion tests</subject><subject>Dimethyl sulfoxide</subject><subject>Domains</subject><subject>Electrochemical impedance spectroscopy</subject><subject>Electrochemistry</subject><subject>Electrode polarization</subject><subject>Electrodeposition</subject><subject>Electrolytic cells</subject><subject>Hydrophobic surfaces</subject><subject>Hydrophobicity</subject><subject>Industrial Chemistry/Chemical Engineering</subject><subject>Light reflection</subject><subject>Material chemistry</subject><subject>Nickel oxides</subject><subject>Photovoltaic cells</subject><subject>Physical Chemistry</subject><subject>Protective coatings</subject><subject>Scanning electron microscopy</subject><subject>Short Communication</subject><subject>Solar Cells</subject><subject>Substrates</subject><subject>Thin films</subject><subject>X-ray diffraction</subject><issn>0021-891X</issn><issn>1572-8838</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNp9kMFLwzAUxoMoOKf_gKeCJw_Vl6Rp0uMY6oThDip4C2marpldU5NO2H9vZkVvHh4PHr_v430fQpcYbjAAvw0YBEAKuIhDgaXkCE0w4yQVgopjNAEgOBUFfjtFZyFsAKAgeTZB98-2W7cmDYPpE9MaPXhXmd4FO1jXJa5Owq43vtlX3vWNK61Oylbp9-TJrpKhsV1S23YbztFJrdpgLn72FL3e373MF-ly9fA4ny1TndFsiA-wWuV1XVZECabqAhel4HmuSZXTvFS8ZIozUpU805opSjNKqY4BmRGs4JRO0fXo26hW9t5uld9Lp6xczJbycAOSceAAnziyVyPbe_exM2GQG7fzXXxPEhLDi0KwPFJkpLR3IXhT_9pikIdu5ditjN3K724liSI6ikKEu7Xxf9b_qL4A7LR7JA</recordid><startdate>20190601</startdate><enddate>20190601</enddate><creator>Bahramian, A.</creator><creator>Eyraud, M.</creator><creator>Vacandio, F.</creator><creator>Hornebecq, V.</creator><creator>Djenizian, T.</creator><creator>Knauth, P.</creator><general>Springer Netherlands</general><general>Springer Nature B.V</general><general>Springer Verlag</general><scope>AAYXX</scope><scope>CITATION</scope><scope>1XC</scope><scope>VOOES</scope><orcidid>https://orcid.org/0000-0003-2704-206X</orcidid><orcidid>https://orcid.org/0000-0002-7814-363X</orcidid></search><sort><creationdate>20190601</creationdate><title>Single-step electrodeposition of superhydrophobic black NiO thin films</title><author>Bahramian, A. ; Eyraud, M. ; Vacandio, F. ; Hornebecq, V. ; Djenizian, T. ; Knauth, P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c434t-895fa6ffbd2a85af919b8766c2d636ba7b5a752db74cc5a334333c0075e859733</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Chemical Sciences</topic><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Contact angle</topic><topic>Copper</topic><topic>Corrosion resistance</topic><topic>Corrosion tests</topic><topic>Dimethyl sulfoxide</topic><topic>Domains</topic><topic>Electrochemical impedance spectroscopy</topic><topic>Electrochemistry</topic><topic>Electrode polarization</topic><topic>Electrodeposition</topic><topic>Electrolytic cells</topic><topic>Hydrophobic surfaces</topic><topic>Hydrophobicity</topic><topic>Industrial Chemistry/Chemical Engineering</topic><topic>Light reflection</topic><topic>Material chemistry</topic><topic>Nickel oxides</topic><topic>Photovoltaic cells</topic><topic>Physical Chemistry</topic><topic>Protective coatings</topic><topic>Scanning electron microscopy</topic><topic>Short Communication</topic><topic>Solar Cells</topic><topic>Substrates</topic><topic>Thin films</topic><topic>X-ray diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Bahramian, A.</creatorcontrib><creatorcontrib>Eyraud, M.</creatorcontrib><creatorcontrib>Vacandio, F.</creatorcontrib><creatorcontrib>Hornebecq, V.</creatorcontrib><creatorcontrib>Djenizian, T.</creatorcontrib><creatorcontrib>Knauth, P.</creatorcontrib><collection>CrossRef</collection><collection>Hyper Article en Ligne (HAL)</collection><collection>Hyper Article en Ligne (HAL) (Open Access)</collection><jtitle>Journal of applied electrochemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Bahramian, A.</au><au>Eyraud, M.</au><au>Vacandio, F.</au><au>Hornebecq, V.</au><au>Djenizian, T.</au><au>Knauth, P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Single-step electrodeposition of superhydrophobic black NiO thin films</atitle><jtitle>Journal of applied electrochemistry</jtitle><stitle>J Appl Electrochem</stitle><date>2019-06-01</date><risdate>2019</risdate><volume>49</volume><issue>6</issue><spage>621</spage><epage>629</epage><pages>621-629</pages><issn>0021-891X</issn><eissn>1572-8838</eissn><abstract>Black finished surfaces have extensive applications in many domains, such as optics, solar cells, and aerospace. The single-step electrodeposition of superhydrophobic black NiO films from a dimethyl sulfoxide-based electrolyte is described in this paper. The physicochemical properties of the obtained film were characterized using scanning electron microscopy, X-ray diffraction, and electrochemical tests (electrochemical impedance spectroscopy and potentiodynamic polarization). A rough surface with a low reflection of light was formed after the deposition process that increased the contact angle of water from about 87° (for bare Cu) to 163° (in presence of the black coating), which improved the corrosion resistance of the Cu substrate by about 30%. The formed black NiO film revealed a notably high stability and kept its appearance even after corrosion tests.
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| source | Springer Nature - Complete Springer Journals |
| subjects | Chemical Sciences Chemistry Chemistry and Materials Science Contact angle Copper Corrosion resistance Corrosion tests Dimethyl sulfoxide Domains Electrochemical impedance spectroscopy Electrochemistry Electrode polarization Electrodeposition Electrolytic cells Hydrophobic surfaces Hydrophobicity Industrial Chemistry/Chemical Engineering Light reflection Material chemistry Nickel oxides Photovoltaic cells Physical Chemistry Protective coatings Scanning electron microscopy Short Communication Solar Cells Substrates Thin films X-ray diffraction |
| title | Single-step electrodeposition of superhydrophobic black NiO thin films |
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