Structural analysis of W3O/WO3 and TiO/TiO2 periodic multilayer thin films sputter deposited by the reactive gas pulsing process
DC reactive sputtering was used to deposit titanium and tungsten-based metal/oxide periodic nanometric multilayers using pure metallic targets and Ar+O2 gas mixture as reactive atmosphere. The innovative technique namely, the reactive gas pulsing process allows switching between the metal and oxide...
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| Veröffentlicht in: | Thin solid films 2012-05, Vol.520 (14), p.4778-4781 |
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| creator | Cacucci, A. Potin, V. Imhoff, L. Marco de Lucas, M.C. Martin, N. |
| description | DC reactive sputtering was used to deposit titanium and tungsten-based metal/oxide periodic nanometric multilayers using pure metallic targets and Ar+O2 gas mixture as reactive atmosphere. The innovative technique namely, the reactive gas pulsing process allows switching between the metal and oxide to prepare a periodic multilayered structure with various metalloid concentrations and nanometric dimensions. The same pulsing period was used for each deposition to produce metal-oxide periodic alternations close to 10nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Raman spectroscopy, X-ray diffraction and Energy-dispersiveX-ray spectroscopy techniques. The high resolution transmission electron microscopy allowed observing the sharpness of the metal/oxide interfaces and measuring the thickness of each kind of layers. Moreover, the crystalline structure of metal and metal oxide layers was also studied. The difference of reactivity between the two systems leads to periodic β-W3O/a-WO3 and face-centered-cubic-TiO/a-TiO2 multilayers. |
| doi_str_mv | 10.1016/j.tsf.2011.10.180 |
| format | Article |
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The innovative technique namely, the reactive gas pulsing process allows switching between the metal and oxide to prepare a periodic multilayered structure with various metalloid concentrations and nanometric dimensions. The same pulsing period was used for each deposition to produce metal-oxide periodic alternations close to 10nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Raman spectroscopy, X-ray diffraction and Energy-dispersiveX-ray spectroscopy techniques. The high resolution transmission electron microscopy allowed observing the sharpness of the metal/oxide interfaces and measuring the thickness of each kind of layers. Moreover, the crystalline structure of metal and metal oxide layers was also studied. 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The innovative technique namely, the reactive gas pulsing process allows switching between the metal and oxide to prepare a periodic multilayered structure with various metalloid concentrations and nanometric dimensions. The same pulsing period was used for each deposition to produce metal-oxide periodic alternations close to 10nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Raman spectroscopy, X-ray diffraction and Energy-dispersiveX-ray spectroscopy techniques. The high resolution transmission electron microscopy allowed observing the sharpness of the metal/oxide interfaces and measuring the thickness of each kind of layers. Moreover, the crystalline structure of metal and metal oxide layers was also studied. The difference of reactivity between the two systems leads to periodic β-W3O/a-WO3 and face-centered-cubic-TiO/a-TiO2 multilayers.</description><subject>Acoustics</subject><subject>Composition and phase identification</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition by sputtering</subject><subject>Engineering Sciences</subject><subject>Exact sciences and technology</subject><subject>Magnetron sputtering</subject><subject>Materials</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Micro and nanotechnologies</subject><subject>Microelectronics</subject><subject>Multilayers</subject><subject>Physics</subject><subject>Reactive gas pulsing process</subject><subject>Structure and morphology; thickness</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film structure and morphology</subject><subject>Titanium oxide</subject><subject>Tungsten oxide</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNp9kEGP0zAQhS0EEmXhB3DzhQOHtGM7cRJxWq2ARarUA4v2aLljZ9eVm0Qep1Jv_HRcivbIYTTSN-_NaB5jHwWsBQi9OawzDWsJQqwvqINXbCW6tq9kq8RrtgKoodLQw1v2jugAAEJKtWK_f-a0YF6SjdyONp4pEJ8G_qh2m8edKszxh7DblJJ89ilMLiA_LjGHaM8-8fwcRj6EeCRO85JzQc7PE4XsHd-fy9zz5C3mcPL8yRKfl0hhfOJzmtATvWdvBhvJf_jXb9ivb18f7u6r7e77j7vbbYWyF7kafCtQay0AlVfagu37FvW-lkpjIywCOOyhdfuur6V0g63bfe0ah52qlUR1wz5f9z7baOYUjjadzWSDub_dmgsDqQBUo06iaMVVi2kiSn54MQgwl7jNwZS4zSXuv6iD4vl09cyW0MYh2REDvRhl09eqaXTRfbnqfHn2FHwyhMGP6F1IHrNxU_jPlT84zpWq</recordid><startdate>20120501</startdate><enddate>20120501</enddate><creator>Cacucci, A.</creator><creator>Potin, V.</creator><creator>Imhoff, L.</creator><creator>Marco de Lucas, M.C.</creator><creator>Martin, N.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>1XC</scope><orcidid>https://orcid.org/0000-0003-1115-5342</orcidid><orcidid>https://orcid.org/0000-0001-5135-4026</orcidid><orcidid>https://orcid.org/0000-0003-4462-3544</orcidid></search><sort><creationdate>20120501</creationdate><title>Structural analysis of W3O/WO3 and TiO/TiO2 periodic multilayer thin films sputter deposited by the reactive gas pulsing process</title><author>Cacucci, A. ; Potin, V. ; Imhoff, L. ; Marco de Lucas, M.C. ; Martin, N.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c291t-fe71c66610c3e36a0a997c6b4236c51ac00dc907db89422dfa47b4d5dc83432c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Acoustics</topic><topic>Composition and phase identification</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition by sputtering</topic><topic>Engineering Sciences</topic><topic>Exact sciences and technology</topic><topic>Magnetron sputtering</topic><topic>Materials</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Micro and nanotechnologies</topic><topic>Microelectronics</topic><topic>Multilayers</topic><topic>Physics</topic><topic>Reactive gas pulsing process</topic><topic>Structure and morphology; thickness</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film structure and morphology</topic><topic>Titanium oxide</topic><topic>Tungsten oxide</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Cacucci, A.</creatorcontrib><creatorcontrib>Potin, V.</creatorcontrib><creatorcontrib>Imhoff, L.</creatorcontrib><creatorcontrib>Marco de Lucas, M.C.</creatorcontrib><creatorcontrib>Martin, N.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Cacucci, A.</au><au>Potin, V.</au><au>Imhoff, L.</au><au>Marco de Lucas, M.C.</au><au>Martin, N.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Structural analysis of W3O/WO3 and TiO/TiO2 periodic multilayer thin films sputter deposited by the reactive gas pulsing process</atitle><jtitle>Thin solid films</jtitle><date>2012-05-01</date><risdate>2012</risdate><volume>520</volume><issue>14</issue><spage>4778</spage><epage>4781</epage><pages>4778-4781</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>DC reactive sputtering was used to deposit titanium and tungsten-based metal/oxide periodic nanometric multilayers using pure metallic targets and Ar+O2 gas mixture as reactive atmosphere. The innovative technique namely, the reactive gas pulsing process allows switching between the metal and oxide to prepare a periodic multilayered structure with various metalloid concentrations and nanometric dimensions. The same pulsing period was used for each deposition to produce metal-oxide periodic alternations close to 10nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Raman spectroscopy, X-ray diffraction and Energy-dispersiveX-ray spectroscopy techniques. The high resolution transmission electron microscopy allowed observing the sharpness of the metal/oxide interfaces and measuring the thickness of each kind of layers. Moreover, the crystalline structure of metal and metal oxide layers was also studied. The difference of reactivity between the two systems leads to periodic β-W3O/a-WO3 and face-centered-cubic-TiO/a-TiO2 multilayers.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2011.10.180</doi><tpages>4</tpages><orcidid>https://orcid.org/0000-0003-1115-5342</orcidid><orcidid>https://orcid.org/0000-0001-5135-4026</orcidid><orcidid>https://orcid.org/0000-0003-4462-3544</orcidid></addata></record> |
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| subjects | Acoustics Composition and phase identification Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Engineering Sciences Exact sciences and technology Magnetron sputtering Materials Materials science Methods of deposition of films and coatings film growth and epitaxy Micro and nanotechnologies Microelectronics Multilayers Physics Reactive gas pulsing process Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Titanium oxide Tungsten oxide |
| title | Structural analysis of W3O/WO3 and TiO/TiO2 periodic multilayer thin films sputter deposited by the reactive gas pulsing process |
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