Evaluation of thermal stability in spectrally selective few-layer metallo-dielectric structures for solar thermophotovoltaics

•An extremely high-thermal-stability few-layer structure is proposed.•A HfO2 layer on a Mo substrate is more stable than that on a W substrate at 1473 K.•The degradation of the structure at 1473 K is due to Mo thin-film oxidation.•The potential stability of few-layer structures for high-temperature...

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Veröffentlicht in:Journal of quantitative spectroscopy & radiative transfer 2018-06, Vol.212, p.45-49
Hauptverfasser: Shimizu, Makoto, Kohiyama, Asaka, Yugami, Hiroo
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Sprache:eng
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