Influence of the Aminated Conditions on the pH Sensitivity of Silica and Amorphous Silicon Film
Silicon nitride has been widely used as a pH sensitive membrane of the ion sensitive field e#ect transistor (ISFET) thanks to the high reactivity of the SiNH2 sites to the H f ions. In this paper, we report experimental results on the H+ sensitivity of silica and amorphous silicon aminated films, ob...
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| Veröffentlicht in: | Journal of the European Ceramic Society 1997, Vol.17 (15-16), p.202-2024 |
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| container_title | Journal of the European Ceramic Society |
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| creator | Baccar, Z.M. Jaffrezic-Renault, N. Fourmond, E. Lemiti, M. Grekov, F.F. |
| description | Silicon nitride has been widely used as a pH sensitive membrane of the ion sensitive field e#ect transistor (ISFET) thanks to the high reactivity of the SiNH2 sites to the H f ions. In this paper, we report experimental results on the H+ sensitivity of silica and amorphous silicon aminated films, obtained by the photo-CVD. We have studied the dependence of their response to pH as a function of the time and the temperature of amination of thejIm. The response of the aminatedjilms (silica and amorphous silicon) is quasi-Nernstian for amination exposure time higher than 1 min, deposited at temperature lower than 200°C. A theoretical model of deposition is presented. It can explain the influence of the deposition conditions. Published by Elsevier Science Limited. |
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In this paper, we report experimental results on the H+ sensitivity of silica and amorphous silicon aminated films, obtained by the photo-CVD. We have studied the dependence of their response to pH as a function of the time and the temperature of amination of thejIm. The response of the aminatedjilms (silica and amorphous silicon) is quasi-Nernstian for amination exposure time higher than 1 min, deposited at temperature lower than 200°C. A theoretical model of deposition is presented. It can explain the influence of the deposition conditions. 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| ispartof | Journal of the European Ceramic Society, 1997, Vol.17 (15-16), p.202-2024 |
| issn | 0955-2219 1873-619X |
| language | eng |
| recordid | cdi_hal_primary_oai_HAL_hal_01974244v1 |
| source | Elsevier ScienceDirect Journals |
| subjects | Condensed Matter Engineering Sciences Materials Science Micro and nanotechnologies Microelectronics Physics |
| title | Influence of the Aminated Conditions on the pH Sensitivity of Silica and Amorphous Silicon Film |
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