Multi-structural TiO2 film synthesised by an atmospheric pressure plasma-enhanced chemical vapour deposition microwave torch

In this study, a microwave plasma torch working at atmospheric pressure has been used for TiO2 thin film synthesis. We first optimised the deposition conditions in order to avoid the formation of powder in the plasma phase. Then, the characterisation of the TiO2 films deposited in the optimised cond...

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Veröffentlicht in:	Thin solid films 2016-02, Vol.600, p.43-52
Hauptverfasser:	Gazal, Y., Dublanche-Tixier, C., Chazelas, C., Colas, M., Carles, P., Tristant, P.
Format:	Artikel
Sprache:	eng
Schlagworte:	Atmospheric Pressure Barometric pressure Chemical Sciences Deposition Engineering Sciences Material chemistry Materials Microstructure Microwave Plasma Torch Microwaves Plasma enhanced chemical vapor deposition Plasmas Solid phases Thin Film Thin films Titanium Dioxide
Online-Zugang:	Volltext
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