Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line–Space Patterning

A promising alternative for the next-generation lithography is based on the directed self-assembly of block copolymers (BCPs) used as a bottom-up tool for the definition of nanometric features. Herein, a straightforward integration flow for line-space patterning is reported for a silicon BCP system,...

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Veröffentlicht in:	ACS applied materials & interfaces 2017-12, Vol.9 (49), p.43043-43050
Hauptverfasser:	Legrain, Antoine, Fleury, Guillaume, Mumtaz, Muhammad, Navarro, Christophe, Arias-Zapata, Javier, Chevalier, Xavier, Cayrefourcq, Ian, Zelsmann, Marc
Format:	Artikel
Sprache:	eng
Schlagworte:	Physics
Online-Zugang:	Volltext
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