All-Dielectric Color Filters Using SiGe-Based Mie Resonator Arrays

Dielectric Mie resonators have attracted a great deal of attention over the past few years thanks to their remarkable capabilities in manipulating light propagation at the nanoscale. However, the practical implementation of technological products is still elusive. One of the important limits is the...

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Veröffentlicht in:ACS photonics 2017-04, Vol.4 (4), p.873-883
Hauptverfasser: Wood, Thomas, Naffouti, Meher, Berthelot, Johann, David, Thomas, Claude, Jean-Benoît, Métayer, Léo, Delobbe, Anne, Favre, Luc, Ronda, Antoine, Berbezier, Isabelle, Bonod, Nicolas, Abbarchi, Marco
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container_title ACS photonics
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creator Wood, Thomas
Naffouti, Meher
Berthelot, Johann
David, Thomas
Claude, Jean-Benoît
Métayer, Léo
Delobbe, Anne
Favre, Luc
Ronda, Antoine
Berbezier, Isabelle
Bonod, Nicolas
Abbarchi, Marco
description Dielectric Mie resonators have attracted a great deal of attention over the past few years thanks to their remarkable capabilities in manipulating light propagation at the nanoscale. However, the practical implementation of technological products is still elusive. One of the important limits is the absence of a high-performing material and a fabrication method that can be easily integrated into modern microelectronic devices at affordable costs. Here, we provide theoretical and experimental evidence of an alternative semiconductor material, SiGe alloys, for dielectric Mie resonator applications. As a material compatible with the processing requirements of the semiconductor industry, it possesses comparable optical properties to its conventional Si-based counterpart at visible frequencies in spite of its higher optical losses. These dielectric resonant particles can be obtained over very large surfaces on arbitrary silica substrates via spontaneous solid state dewetting of ultrathin (
doi_str_mv 10.1021/acsphotonics.6b00944
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However, the practical implementation of technological products is still elusive. One of the important limits is the absence of a high-performing material and a fabrication method that can be easily integrated into modern microelectronic devices at affordable costs. Here, we provide theoretical and experimental evidence of an alternative semiconductor material, SiGe alloys, for dielectric Mie resonator applications. As a material compatible with the processing requirements of the semiconductor industry, it possesses comparable optical properties to its conventional Si-based counterpart at visible frequencies in spite of its higher optical losses. These dielectric resonant particles can be obtained over very large surfaces on arbitrary silica substrates via spontaneous solid state dewetting of ultrathin (&lt;100 nm) SiGe amorphous layers. Furthermore, the polycrystalline SiGe islands can be precisely organized in uniform arrays featuring low size dispersion. As an example, we demonstrate SiGe-based Mie resonator arrays functioning as color pass-band filters across the full visible spectral range. 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title All-Dielectric Color Filters Using SiGe-Based Mie Resonator Arrays
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