Nanoscale concentration and strain distribution in pseudomorphic films Si1−xGex/Si processed by pulsed laser induced epitaxy

► Si1−xGex/Si pseudomorphic layers were synthesized by pulsed laser induced epitaxy. ► We performed strain and concentration measurements at the nanometer scale. ► Ge profiles are graded from the interface to the surface due segregation effects. ► The Ge profile is largely influenced by the temporal...

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Veröffentlicht in:Applied surface science 2012-09, Vol.258 (23), p.9208-9212
Hauptverfasser: Vincent, L., Fossard, F., Kociniewski, T., Largeau, L., Cherkashin, N., Hÿtch, M.J., Debarre, D., Sauvage, T., Claverie, A., Boulmer, J., Bouchier, D.
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