TiO2 anatase films obtained by direct liquid injection atomic layer deposition at low temperature

TiO2 thin films were grown by direct liquid injection atomic layer deposition (DLI-ALD) with infrared rapid thermal heating using titanium tetraisopropoxide and water as precursors. This titanium tetraisopropoxide/water process exhibited a growth rate of 0.018nm/cycle in a self-limited ALD growth mo...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Applied surface science 2014, Vol.288, p.201-207
Hauptverfasser:	AVRIL, L, REYMOND-LARUINAZ, S, DECAMS, J. M, BRUYERE, S, POTIN, V, MARCO DE LUCAS, M. C, IMHOFF, L
Format:	Artikel
Sprache:	eng
Schlagworte:	Anatase Atomic layer deposition Chemical Sciences Condensed Matter Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Infrared heating Liquid injection Material chemistry Materials Science Physics Precursors Thin films Titanium Titanium dioxide
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!