Scattering losses in multidielectric structures designed for giant optical field enhancement
Multidielectric coatings are analytically designed to reach total absorption and maximum field enhancement at resonances. A resonant multi-dielectric stack was fabricated to be resonant at 633 nm for an incidence of 45° under TE-polarization. Field enhancement was expected to be around 1000. We disc...
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| Veröffentlicht in: | Applied optics (2004) 2014-02, Vol.53 (4), p.A412-A416, Article A412 |
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| container_end_page | A416 |
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| container_issue | 4 |
| container_start_page | A412 |
| container_title | Applied optics (2004) |
| container_volume | 53 |
| creator | Lereu, Aude L Zerrad, Myriam Ndiaye, Césaire Lemarchand, Fabien Amra, Claude |
| description | Multidielectric coatings are analytically designed to reach total absorption and maximum field enhancement at resonances. A resonant multi-dielectric stack was fabricated to be resonant at 633 nm for an incidence of 45° under TE-polarization. Field enhancement was expected to be around 1000. We discuss the mismatch with the enhancement measured using near field microscopy and using the scattering effect. In particular, scattering was investigated to serve as a far field characterization of such giant optical fields. |
| doi_str_mv | 10.1364/AO.53.00A412 |
| format | Article |
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| identifier | ISSN: 1559-128X |
| ispartof | Applied optics (2004), 2014-02, Vol.53 (4), p.A412-A416, Article A412 |
| issn | 1559-128X 2155-3165 1539-4522 |
| language | eng |
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| source | MEDLINE; Alma/SFX Local Collection; Optica Publishing Group Journals |
| subjects | Coatings Computer Simulation Electromagnetism Energy Transfer Engineering Sciences Far fields Incidence Light Materials Testing Mathematical analysis Metals - chemistry Microscopy Models, Chemical Near fields Optics Photonic Scattering Scattering, Radiation Stacks Surface Plasmon Resonance - methods |
| title | Scattering losses in multidielectric structures designed for giant optical field enhancement |
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