Pulsed laser deposited alumina thin films

Pulsed laser deposited alumina thin films

Thin films of amorphous alumina were fabricated using pulsed laser deposition. Topography, structural, and optical properties of alumina films were investigated depending on process parameters, specifically deposition time under vacuum and partial pressure of argon. Deposited films present good unif...

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Veröffentlicht in:Ceramics international 2016-01, Vol.42 (1), p.1177-1182
Hauptverfasser: Boidin, Rémi, Halenkovič, Tomáš, Nazabal, Virginie, Beneš, Ludvík, Němec, Petr
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Sprache:eng
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Alumina
Amorphous
Chemical Sciences
Material chemistry
Pulsed laser deposition
Refractive index
Thin films
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container_end_page 1182
container_issue 1
container_start_page 1177
container_title Ceramics international
container_volume 42
creator Boidin, Rémi
Halenkovič, Tomáš
Nazabal, Virginie
Beneš, Ludvík
Němec, Petr
description Thin films of amorphous alumina were fabricated using pulsed laser deposition. Topography, structural, and optical properties of alumina films were investigated depending on process parameters, specifically deposition time under vacuum and partial pressure of argon. Deposited films present good uniformity with RMS roughness ranging from 0.35 to 2.50nm. Alumina films with thickness lower than 40nm deposited under vacuum present a non-negligible void content that induces a decrease of the effective refractive index of the layers. Furthermore, introduction of argon gas (at 5×10−4 and 5×10−2mbar) during the deposition process induces grainy structure of the thin films documented by an increase of RMS roughness from 0.35 to 1.5nm. A decrease of the alumina layers' refractive index is observed in the 300–7500nm spectral range when increasing Ar pressure.
doi_str_mv 10.1016/j.ceramint.2015.09.048
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subjects Alumina
Amorphous
Chemical Sciences
Material chemistry
Pulsed laser deposition
Refractive index
Thin films
title Pulsed laser deposited alumina thin films
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