Evidence of coexistence of micro and nanoporosity of organo-silica polymeric films deposited on silicon by plasma deposition
A range of hybrid, SiOCH films were deposited on silicon substrates within a radio frequency plasma reactor using hexamethyldisiloxane (HMDSO) as a precursor. The plasma polymerized films were deposited at various HMDSO/argon/oxygen ratios. The composition and structure, at microscopic and nanoscopi...
Gespeichert in:
Veröffentlicht in: | Materials chemistry and physics 2013-09, Vol.141 (2-3), p.602-612 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 612 |
---|---|
container_issue | 2-3 |
container_start_page | 602 |
container_title | Materials chemistry and physics |
container_volume | 141 |
creator | Purohit, Viswas Mielczarski, Ela Mielczarski, Jerzy A. Akesso, Laurent |
description | A range of hybrid, SiOCH films were deposited on silicon substrates within a radio frequency plasma reactor using hexamethyldisiloxane (HMDSO) as a precursor. The plasma polymerized films were deposited at various HMDSO/argon/oxygen ratios. The composition and structure, at microscopic and nanoscopic levels, of the deposited films were determined by external reflection and transmission Fourier Transform Infrared (FTIR) spectroscopy as well as by X-Ray Photoelectron Spectroscopy (XPS). The content of carbon and oxygen in films were found to be inversely proportional to each other. XPS results showed that the outermost surface of the deposited films are nanoporous and coexist with microporosity which was revealed by electron microscopy. The structure of deposited coatings is anisotropic as was documented by polarized external reflection FTIR spectroscopy. Several correlations between the film chemical composition, surface structure, and macroscopic properties of the films such as: hydrophobicity and hydrophilicity were established.
•Hybrid organo-polymer silicon films deposited by RF plasma on silicon substrates.•FTIR and XPS reveal porosity by interpreting bonding between Si and –O.•Quantification of nano & microporosity are identified with bonding of Si with –O. |
doi_str_mv | 10.1016/j.matchemphys.2013.04.040 |
format | Article |
fullrecord | <record><control><sourceid>elsevier_hal_p</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_01119533v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0254058413003623</els_id><sourcerecordid>S0254058413003623</sourcerecordid><originalsourceid>FETCH-LOGICAL-c355t-50ad303b3a1d7fb8a957d87946b194db44190b11b0999bd0af36cb0e75f607b33</originalsourceid><addsrcrecordid>eNqNUE1Lw0AUXETBWv0P69FD6nvdpOkeS1ErFLzoedmv2C1JNuyGYsAf78Za8Sg8GN6bmQczhNwizBBwcb-fNbLXO9t0uyHO5oBsBnkaOCMTXJY8Ywzn52QC8yLPoFjml-Qqxj0AlohsQj4fDs7YVlvqK6q9_XCxP62N08FT2RraytZ3Pvjo-mFkfHhPlyy62mlJO18PjQ1O08rVTaTGdqPSGupb-q1JqAba1TI28kQ7316Ti0rW0d784JS8PT68rjfZ9uXpeb3aZpoVRZ8VIA0DpphEU1ZqKXlRmpQtXyjkuVF5jhwUogLOuTIgK7bQCmxZVAsoFWNTcnf8u5O16IJrZBiEl05sVlsx3gARecHYAZOWH7Upe4zBVr8GBDFWLvbiT-VirFxAngaSd3302hTm4GwQUbuxTeOC1b0w3v3jyxeMAJLc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Evidence of coexistence of micro and nanoporosity of organo-silica polymeric films deposited on silicon by plasma deposition</title><source>Elsevier ScienceDirect Journals</source><creator>Purohit, Viswas ; Mielczarski, Ela ; Mielczarski, Jerzy A. ; Akesso, Laurent</creator><creatorcontrib>Purohit, Viswas ; Mielczarski, Ela ; Mielczarski, Jerzy A. ; Akesso, Laurent</creatorcontrib><description>A range of hybrid, SiOCH films were deposited on silicon substrates within a radio frequency plasma reactor using hexamethyldisiloxane (HMDSO) as a precursor. The plasma polymerized films were deposited at various HMDSO/argon/oxygen ratios. The composition and structure, at microscopic and nanoscopic levels, of the deposited films were determined by external reflection and transmission Fourier Transform Infrared (FTIR) spectroscopy as well as by X-Ray Photoelectron Spectroscopy (XPS). The content of carbon and oxygen in films were found to be inversely proportional to each other. XPS results showed that the outermost surface of the deposited films are nanoporous and coexist with microporosity which was revealed by electron microscopy. The structure of deposited coatings is anisotropic as was documented by polarized external reflection FTIR spectroscopy. Several correlations between the film chemical composition, surface structure, and macroscopic properties of the films such as: hydrophobicity and hydrophilicity were established.
•Hybrid organo-polymer silicon films deposited by RF plasma on silicon substrates.•FTIR and XPS reveal porosity by interpreting bonding between Si and –O.•Quantification of nano & microporosity are identified with bonding of Si with –O.</description><identifier>ISSN: 0254-0584</identifier><identifier>EISSN: 1879-3312</identifier><identifier>DOI: 10.1016/j.matchemphys.2013.04.040</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Continental interfaces, environment ; Earth Sciences ; Environmental Sciences ; FTIR ; Microporous materials ; Mineralogy ; Plasma deposition ; Polymers ; Sciences of the Universe ; XPS</subject><ispartof>Materials chemistry and physics, 2013-09, Vol.141 (2-3), p.602-612</ispartof><rights>2013 Elsevier B.V.</rights><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c355t-50ad303b3a1d7fb8a957d87946b194db44190b11b0999bd0af36cb0e75f607b33</citedby><cites>FETCH-LOGICAL-c355t-50ad303b3a1d7fb8a957d87946b194db44190b11b0999bd0af36cb0e75f607b33</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0254058413003623$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>230,314,776,780,881,3537,27901,27902,65306</link.rule.ids><backlink>$$Uhttps://hal.science/hal-01119533$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Purohit, Viswas</creatorcontrib><creatorcontrib>Mielczarski, Ela</creatorcontrib><creatorcontrib>Mielczarski, Jerzy A.</creatorcontrib><creatorcontrib>Akesso, Laurent</creatorcontrib><title>Evidence of coexistence of micro and nanoporosity of organo-silica polymeric films deposited on silicon by plasma deposition</title><title>Materials chemistry and physics</title><description>A range of hybrid, SiOCH films were deposited on silicon substrates within a radio frequency plasma reactor using hexamethyldisiloxane (HMDSO) as a precursor. The plasma polymerized films were deposited at various HMDSO/argon/oxygen ratios. The composition and structure, at microscopic and nanoscopic levels, of the deposited films were determined by external reflection and transmission Fourier Transform Infrared (FTIR) spectroscopy as well as by X-Ray Photoelectron Spectroscopy (XPS). The content of carbon and oxygen in films were found to be inversely proportional to each other. XPS results showed that the outermost surface of the deposited films are nanoporous and coexist with microporosity which was revealed by electron microscopy. The structure of deposited coatings is anisotropic as was documented by polarized external reflection FTIR spectroscopy. Several correlations between the film chemical composition, surface structure, and macroscopic properties of the films such as: hydrophobicity and hydrophilicity were established.
•Hybrid organo-polymer silicon films deposited by RF plasma on silicon substrates.•FTIR and XPS reveal porosity by interpreting bonding between Si and –O.•Quantification of nano & microporosity are identified with bonding of Si with –O.</description><subject>Continental interfaces, environment</subject><subject>Earth Sciences</subject><subject>Environmental Sciences</subject><subject>FTIR</subject><subject>Microporous materials</subject><subject>Mineralogy</subject><subject>Plasma deposition</subject><subject>Polymers</subject><subject>Sciences of the Universe</subject><subject>XPS</subject><issn>0254-0584</issn><issn>1879-3312</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqNUE1Lw0AUXETBWv0P69FD6nvdpOkeS1ErFLzoedmv2C1JNuyGYsAf78Za8Sg8GN6bmQczhNwizBBwcb-fNbLXO9t0uyHO5oBsBnkaOCMTXJY8Ywzn52QC8yLPoFjml-Qqxj0AlohsQj4fDs7YVlvqK6q9_XCxP62N08FT2RraytZ3Pvjo-mFkfHhPlyy62mlJO18PjQ1O08rVTaTGdqPSGupb-q1JqAba1TI28kQ7316Ti0rW0d784JS8PT68rjfZ9uXpeb3aZpoVRZ8VIA0DpphEU1ZqKXlRmpQtXyjkuVF5jhwUogLOuTIgK7bQCmxZVAsoFWNTcnf8u5O16IJrZBiEl05sVlsx3gARecHYAZOWH7Upe4zBVr8GBDFWLvbiT-VirFxAngaSd3302hTm4GwQUbuxTeOC1b0w3v3jyxeMAJLc</recordid><startdate>20130916</startdate><enddate>20130916</enddate><creator>Purohit, Viswas</creator><creator>Mielczarski, Ela</creator><creator>Mielczarski, Jerzy A.</creator><creator>Akesso, Laurent</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>AAYXX</scope><scope>CITATION</scope><scope>1XC</scope></search><sort><creationdate>20130916</creationdate><title>Evidence of coexistence of micro and nanoporosity of organo-silica polymeric films deposited on silicon by plasma deposition</title><author>Purohit, Viswas ; Mielczarski, Ela ; Mielczarski, Jerzy A. ; Akesso, Laurent</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c355t-50ad303b3a1d7fb8a957d87946b194db44190b11b0999bd0af36cb0e75f607b33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Continental interfaces, environment</topic><topic>Earth Sciences</topic><topic>Environmental Sciences</topic><topic>FTIR</topic><topic>Microporous materials</topic><topic>Mineralogy</topic><topic>Plasma deposition</topic><topic>Polymers</topic><topic>Sciences of the Universe</topic><topic>XPS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Purohit, Viswas</creatorcontrib><creatorcontrib>Mielczarski, Ela</creatorcontrib><creatorcontrib>Mielczarski, Jerzy A.</creatorcontrib><creatorcontrib>Akesso, Laurent</creatorcontrib><collection>CrossRef</collection><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Materials chemistry and physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Purohit, Viswas</au><au>Mielczarski, Ela</au><au>Mielczarski, Jerzy A.</au><au>Akesso, Laurent</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Evidence of coexistence of micro and nanoporosity of organo-silica polymeric films deposited on silicon by plasma deposition</atitle><jtitle>Materials chemistry and physics</jtitle><date>2013-09-16</date><risdate>2013</risdate><volume>141</volume><issue>2-3</issue><spage>602</spage><epage>612</epage><pages>602-612</pages><issn>0254-0584</issn><eissn>1879-3312</eissn><abstract>A range of hybrid, SiOCH films were deposited on silicon substrates within a radio frequency plasma reactor using hexamethyldisiloxane (HMDSO) as a precursor. The plasma polymerized films were deposited at various HMDSO/argon/oxygen ratios. The composition and structure, at microscopic and nanoscopic levels, of the deposited films were determined by external reflection and transmission Fourier Transform Infrared (FTIR) spectroscopy as well as by X-Ray Photoelectron Spectroscopy (XPS). The content of carbon and oxygen in films were found to be inversely proportional to each other. XPS results showed that the outermost surface of the deposited films are nanoporous and coexist with microporosity which was revealed by electron microscopy. The structure of deposited coatings is anisotropic as was documented by polarized external reflection FTIR spectroscopy. Several correlations between the film chemical composition, surface structure, and macroscopic properties of the films such as: hydrophobicity and hydrophilicity were established.
•Hybrid organo-polymer silicon films deposited by RF plasma on silicon substrates.•FTIR and XPS reveal porosity by interpreting bonding between Si and –O.•Quantification of nano & microporosity are identified with bonding of Si with –O.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.matchemphys.2013.04.040</doi><tpages>11</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0254-0584 |
ispartof | Materials chemistry and physics, 2013-09, Vol.141 (2-3), p.602-612 |
issn | 0254-0584 1879-3312 |
language | eng |
recordid | cdi_hal_primary_oai_HAL_hal_01119533v1 |
source | Elsevier ScienceDirect Journals |
subjects | Continental interfaces, environment Earth Sciences Environmental Sciences FTIR Microporous materials Mineralogy Plasma deposition Polymers Sciences of the Universe XPS |
title | Evidence of coexistence of micro and nanoporosity of organo-silica polymeric films deposited on silicon by plasma deposition |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T03%3A24%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-elsevier_hal_p&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Evidence%20of%20coexistence%20of%20micro%20and%20nanoporosity%20of%20organo-silica%20polymeric%20films%20deposited%20on%20silicon%20by%20plasma%20deposition&rft.jtitle=Materials%20chemistry%20and%20physics&rft.au=Purohit,%20Viswas&rft.date=2013-09-16&rft.volume=141&rft.issue=2-3&rft.spage=602&rft.epage=612&rft.pages=602-612&rft.issn=0254-0584&rft.eissn=1879-3312&rft_id=info:doi/10.1016/j.matchemphys.2013.04.040&rft_dat=%3Celsevier_hal_p%3ES0254058413003623%3C/elsevier_hal_p%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rft_els_id=S0254058413003623&rfr_iscdi=true |