Efficient coupler between silicon photonic and metal-insulator-silicon-metal plasmonic waveguides
We report the experimental realization of a compact, efficient coupler between silicon waveguides and vertical metal-insulator-silicon-metal (MISM) plasmonic waveguides. Devices were fabricated using complementary metal-oxide-silicon technology processes, with copper layers that support low-loss pla...
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Veröffentlicht in: | Applied physics letters 2012-12, Vol.101 (25) |
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creator | Emboras, A. Briggs, R. M. Najar, A. Nambiar, S. Delacour, C. Grosse, Ph Augendre, E. Fedeli, J. M. de Salvo, B. Atwater, H. A. Espiau de Lamaestre, R. |
description | We report the experimental realization of a compact, efficient coupler between silicon waveguides and vertical metal-insulator-silicon-metal (MISM) plasmonic waveguides. Devices were fabricated using complementary metal-oxide-silicon technology processes, with copper layers that support low-loss plasmonic modes in the MISM structures at a wavelength of 1550 nm. By implementing a short (0.5 μm) optimized metal-insulator-silicon-insulator structure inserted between the photonic and plasmonic waveguide sections, we demonstrate experimental coupling loss of 2.5 dB, despite the high optical confinement of the MISM mode and mismatch with the silicon waveguide mode. |
doi_str_mv | 10.1063/1.4772941 |
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By implementing a short (0.5 μm) optimized metal-insulator-silicon-insulator structure inserted between the photonic and plasmonic waveguide sections, we demonstrate experimental coupling loss of 2.5 dB, despite the high optical confinement of the MISM mode and mismatch with the silicon waveguide mode.</description><subject>Confinement</subject><subject>Joining</subject><subject>Noise levels</subject><subject>Optics</subject><subject>Photonics</subject><subject>Physics</subject><subject>Plasmonics</subject><subject>Silicon</subject><subject>Waveguides</subject><subject>Wavelengths</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNpFkD1PwzAURS0EEqUw8A8ywuDiFzdxPFZVoUiVWGC2bOeZGrlxiJNW_Hv6JZie3r1HZ7iE3AObACv5E0ymQuRyChdkBEwIygGqSzJijHFaygKuyU1KX_u3yDkfEb1wzluPTZ_ZOLQBu8xgv0NssuSDt7HJ2nXsY-Ntpps622CvA_VNGoLuY0fPED3mWRt02hzZnd7i5-BrTLfkyumQ8O58x-TjefE-X9LV28vrfLailnPoqQBT51oYKB0WzBaOA0NjbcFzXSAItq-NBOeEFXlpOGfGVVLUaGoOwjk-Jo8n71oH1XZ-o7sfFbVXy9lKHTLGpMwrWW1hzz6c2LaL3wOmXm18shiCbjAOScEURFUKKct_re1iSh26PzcwdZhcgTpPzn8BxY50vQ</recordid><startdate>20121217</startdate><enddate>20121217</enddate><creator>Emboras, A.</creator><creator>Briggs, R. 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A.</au><au>Espiau de Lamaestre, R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Efficient coupler between silicon photonic and metal-insulator-silicon-metal plasmonic waveguides</atitle><jtitle>Applied physics letters</jtitle><date>2012-12-17</date><risdate>2012</risdate><volume>101</volume><issue>25</issue><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>We report the experimental realization of a compact, efficient coupler between silicon waveguides and vertical metal-insulator-silicon-metal (MISM) plasmonic waveguides. Devices were fabricated using complementary metal-oxide-silicon technology processes, with copper layers that support low-loss plasmonic modes in the MISM structures at a wavelength of 1550 nm. 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subjects | Confinement Joining Noise levels Optics Photonics Physics Plasmonics Silicon Waveguides Wavelengths |
title | Efficient coupler between silicon photonic and metal-insulator-silicon-metal plasmonic waveguides |
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