Amorphous Y-Ba-Cu-O oxide thin films: structural, electrical and dielectric properties correlated with uncooled IR pyroelectric detection performances
Semiconducting amorphous YBa2Cu3O6 + x (x < 0.5, a-YBCO) films of 140 nm to 880 nm thickness were deposited by direct current (DC) hollow cathode sputtering at low temperature (≈ 150 °C). The film microstructure was typically granular. Dielectric measurements from 100 Hz to 2 MHz were performed i...
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Veröffentlicht in: | Thin solid films 2014-02, Vol.553 |
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