Interferometric measurement of the temperature dependence of an index of refraction: application to fused silica

Interferometric measurement of the temperature dependence of an index of refraction: application to fused silica

The light reflected by an uncoated Fabry-Perot etalon presents dark rings which give a very sensitive measurement of the variations of the return optical path in the etalon. By measuring the diameters of these rings as a function of the etalon temperature T, we get a sensitive measurement of the der...

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Veröffentlicht in:Applied Optics 2010-02, Vol.49 (4), p.678-682
Hauptverfasser: Dupouy, Paul-Edouard, Büchner, Matthias, Paquier, Philippe, Trénec, Gérard, Vigué, Jacques
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container_end_page 682
container_issue 4
container_start_page 678
container_title Applied Optics
container_volume 49
creator Dupouy, Paul-Edouard
Büchner, Matthias
Paquier, Philippe
Trénec, Gérard
Vigué, Jacques
description The light reflected by an uncoated Fabry-Perot etalon presents dark rings which give a very sensitive measurement of the variations of the return optical path in the etalon. By measuring the diameters of these rings as a function of the etalon temperature T, we get a sensitive measurement of the derivative dn/dT of the index of refraction n. We have made this experiment with a fused silica etalon and we have achieved a 2% relative uncertainty on dn/dT, comparable to the uncertainty of the best experiments.
doi_str_mv 10.1364/AO.49.000678
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title Interferometric measurement of the temperature dependence of an index of refraction: application to fused silica
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